Difference between revisions of "Solvent Bench 94"

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=== Additional Equipment ===
 
=== Additional Equipment ===
 
* Spinner
 
* Spinner
**The [[Laurrel Spinner]] is interlocked together with Solvent Bench 94. Reserving Solvent Bench 94 is needed to use spinner.
+
**The [[Laurell Spinner]] is interlocked together with Solvent Bench 94. Reserving Solvent Bench 94 is needed to use spinner.
 
**Reserving Solvent Bench 94 also reserves the hot plates in the exhausted enclosure
 
**Reserving Solvent Bench 94 also reserves the hot plates in the exhausted enclosure
  

Revision as of 17:07, 18 October 2021



Solvent Bench 94
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Solvent Bench 94
Equipment Details
Technology Wet bench
Materials Restriction Metals
Material Processed SU-8, PDMS, photoresist
Chemicals Used Acetone, Isopropano, Methanol, Xylene, SU-8 Developer, Remover PG.
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Supported Processes
Maintenance Maintenance



Solvent Bench 94 is located in the ROBIN laboratory. It is mostly used for soft lithography, sample mounting and solvent cleaning. For working with PDMS or SU-8, curing samples, or applying release agent, this bench should be reserved. The reservation of this bench allows exclusive use of the Solvent Bay and the tools located there (i.e., the Solitec Spinner, hot plates, vacuum jars for degassing PDMS and release agent coating), except for the Dimatix Ink Jet printer and Lindbergh Convection Oven. Numerous user-specific processes also take place in Solvent Bench 94.

Announcements

  • Please remember to wear an extra eye protection (mask) when danger of splashing when handling liquids. Masks are available on all benches.
  • We recommend to spin SU-8 and other photoresist without covering the bowl with clean room towels in order to obtain reproducible thicknesses. Make sure you change the Al foil after spinning is done

SU-8 2050, 2100 and Polyimide 2610, 2611 Available for Solvent 94 users

Solvent 94 users have access to SU-8 2050, SU-8 2100, Polyimide 2610 and 2611 on a pay-per-use basis. SU-8 2050 and 2100 are provided in order to have available for the users a fresh supply of photoresist which only have one year shelf life. In addition, pouring from the bottle helps avoid bubble formation, which is a serious problem with viscous photoresists. We have decided to use the same procedure, pay-per-use basis, for Polyimide 2610 and 2611. Both polyimides will also be available in small amber bottles, located in the photoresist cabinet in the ROBIN lab. These bottles are kept in the ROBIN lab freezer, easily accessive to users. You can remove one when you need it. Please use the defrosted chemical first, this is how the system works and it has worked great so far. In this wa users will have fresh polyimide at room temperature readily available. When bottles are filled are degasses in vacuum to remove bubbles that can generate during the transfer.

  • weigh the corresponding bottle (should have LNF staff name in the label) prior to spin
  • record the result in the log sheet located in the PR cabinet (make sure the name on the top of the sheet corresponds to the chemical you are using)
  • spin the material
  • weigh the bottle, record it in the log sheet
  • write the difference in and your short code for internal users or account name for external users.

LNF will bill you for what you use only. The charges will be included in your monthly usage fees. The cost per gram ($/gr)is as follows:

Academic Non-Academic
SU-8 2100 0.8 1.5
SU-8 2050 0.8 1.5
PI 2610 1.5 2.8
PI 2611 1.5 2.8


This procedure relies on your professionalism and honesty and it has worked perfectly with SU-8 users! Do not spoil it.

Capabilities

  • SU-8 photolithography
  • Photoresist coating for dicing
  • Polyimide processing
  • Remover PG hot bath for wafer soaking/cleaning
  • PDMS processing
  • Release agent coating
  • Solvent sample cleaning
  • Wax removal
  • Other user-designed processes, with staff approval
  • Spinning of non-standard materials

System Overview

Hardware Details

  • Acetone bath
  • Isopropanol bath
  • SU-8 developer bath
  • Hot plate with Remover PG bath
  • DI rinse tank
  • Squirt bottles with acetone, IPA, Xylene, SU-8 developper, methanol, ecoclear
  • N2 and DI guns

Additional Equipment

  • Spinner
    • The Laurell Spinner is interlocked together with Solvent Bench 94. Reserving Solvent Bench 94 is needed to use spinner.
    • Reserving Solvent Bench 94 also reserves the hot plates in the exhausted enclosure
    • Two wafer-type hot plates in laminar hood
    • 12"x12" programmable hot plate n laminar hood
    • One wafer type Hot plate for dehydration on top of bench
    • Two 12"x12" hot plates exclusively dedicated to PDMS curing. One of these hot plates MUST be maintained at 80C or below
    • Standard hot plate that can be placed inside the bench is the process calls for it
  • Vacuum desiccators
    • Vacuum desiccator for PDMS degassing
    • Vacuum desiccator for release agent coating
  • Scale and Precision Scale

Substrate Requirements

Most materials (semiconductors, metals, polymers, etc) are allowed at this bench. Some materials which have special hazards or incompatibilities (toxic, contain nanoparticles, corrosive) may be prohibited. All new materials must be approved by staff.

Material Restrictions

The Solvent Bench 94 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.


Supported Processes

This bench supports all the soft lithography processes: SU-8 lithography [1], PDMS preparation and release agent deposition. It is also used for general solvent cleaning, especially to clean samples that have been mounted for lapping or polishing. These processes are described in more detail on the Processes page.

In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on Solvent Bench 94 User Processes. If you are curious to know if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.

Standard Operating Procedure

Widget text will go here.

Checkout Procedure

  1. Read through this page and the Standard Operating Procedure above for the standard processes.
  2. Create a Helpdesk Ticket requesting training.
  3. A tool engineer will schedule a time for initial training.
  4. If the process you are interested is not a standard process you will need to work with a tool engineer on an SOP
  5. Practice with your mentor or another authorized user until you are comfortable with tool operation if the process has been established.
  6. Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.

Maintenance

Acetone, Isopropanol and SU-8 developer tanks are changed or topped up by staff during lab cleans. The beaker of Remover PG is typically kept on the hotplate and changed when necessary.

Solvent squirt bottles are also filled during lab cleans, but users are allowed to fill them as well.

When the solvent waste collection bottle is full, users are required to change the bottle. Unscrew the funnel from the top of the bottle, and attach it to an empty solvent bottle. Cap the full bottle, and write "Solvent Waste" on the new bottle using permanent marker. Solvent should not go down the drain ever. Squirt bottles should also be refilled by users if needed.