Solvent Bench 94

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Solvent Bench 94
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Solvent Bench 94
Equipment Details
Technology Wet bench
Materials Restriction Metals
Material Processed Non CMOS
Chemicals Used Acetone, isopropanol, methanol, xylene, SU-8 Developer, Remover PG, other organic chemicals
Equipment Manual
Overview System Overview
Operating Procedure SOP
Supported Processes Supported Processes
Maintenance Maintenance


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Solvent Bench 94 is located in the ROBIN laboratory. It is mostly used for soft lithography, sample mounting and solvent cleaning. For working with PDMS or SU-8, curing samples, or applying release agent, this bench should be reserved. The reservation of this bench allows exclusive use of the Solvent Bay and the tools located there (i.e., the Solitec Spinner, hot plates, vacuum jars for degassing PDMS and release agent coating), except for the Dimatix Ink Jet printer and Lindbergh Convection Oven. Numerous user-specific processes also take place in Solvent Bench 94.

Announcements

Capabilities

  • SU-8 and other photolithography
  • PDMS processing
  • Release agent coating
  • Solvent sample cleaning
  • Wax removal

System Overview

Hardware Details

  • The Solitec Spinner is interlocked together with Solvent Bench 94. Reserving Solvent Bench 94 is needed to use spinner.
  • Reserving Solvent Bench 94 also reserves the hot plates in the exhausted enclosure
  • Acetone bath
  • Isopropanol bath
  • SU-8 developer bath
  • Hot plate with Remover PG
  • DI rinse tank
  • N2 and DI guns

Substrate Requirements

Most materials (semiconductors, metals, polymers, etc) are allowed at this bench. Some materials which have special hazards or incompatibilities (toxic, contain nanoparticles, corrosive) may be prohibited. All new materials must be approved by staff.

Material Restrictions

The Solvent Bench 94 is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.


Supported Processes

This bench supports all the soft lithography processes: SU-8 lithography, PDMS preparation and release agent deposition. It is also used for general solvent cleaning, especially to clean samples that have been mounted for lapping or polishing. These processes are described in more detail on the Processes page.

In addition to these, this tool has a number of user-created recipes for etching a wide variety of materials. Some of these recipes are documented on Solvent Bench 94 User Processes. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.

Standard Operating Procedure

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Checkout Procedure

  1. Read through this page and the Standard Operating Procedure above for the standard processes.
  2. Create a Helpdesk Ticket requesting training.
  3. A tool engineer will schedule a time for initial training.
  4. If the process you are interested is not a standard process you will need to work with a tool engineer on an SOP
  5. Practice with your mentor or another authorized user until you are comfortable with tool operation if the process has been established.
  6. Schedule a checkout session with a tool engineer via the helpdesk ticket system. If this checkout is successful, the engineer will authorize you on the tool.

Maintenance

Acetone and isopropanol tanks are changed or topped up by staff during lab cleans. The SU-8 Developer tank is changed when dirty. The beaker of Remover PG is typically kept on the hotplate and changed when necessary.

Solvent squirt bottles are also filled during lab cleans, but users are allowed to fill them as well.

When the solvent waste collection bottle is full, users are allowed to change the bottle. Unscrew the funnel from the top of the bottle, and attach it to an empty solvent bottle. Cap the full bottle, and write "Solvent Waste" on the new bottle using permanent marker.

Process Name

  • SU-8 Processing