User contributions
31 March 2022
4 March 2022
4 November 2021
19 October 2021
Tempress S2T2 - Nitride-HTO 4"
Checkout procedure
-116
Tempress S1T4 - LTO 6"
Checkout procedure
-116
Tempress S1T3 - N-type in Situ Doped Poly-Si 6"
Checkout procedure
-116
Tempress S1T2 - LTO 4"
Checkout Procedure
-116
Tempress S1T1 - Annealing
Checkout procedure
-116
Angstrom Engineering Furnace
Checkout procedure
-9
Angstrom Engineering Furnace
Checkout procedure
-116
Angstrom Engineering Furnace
no edit summary
-22
Angstrom Engineering Furnace
no edit summary
-1
YES PB8-2B-CP Vacuum Oven
Checkout Procedure
-117
Nanoquest II Ion Mill
no edit summary
-1
Nanoquest II Ion Mill
no edit summary
-49
18 October 2021
NanoInk DPN 5000
no edit summary
-49
BSL 2 Bio-Room
no edit summary
-49
NanoSpec 6100
Supported processes
-23
SSEC Wafer and Mask Cleaner
Announcements
-45
SSEC Wafer and Mask Cleaner
no edit summary
-49
GSI PECVD
Maintenance
CMP Strasbaugh 6EC
Checkout procedure
-68
CMP Strasbaugh 6EC
Substrate requirements
-5
Olympus BX 51 Fluorescent Microscope
Standard operating procedure
-31
Olympus BX 51 Fluorescent Microscope
no edit summary
-49
MJB 45S
Supported Processes
-55
Lindbergh Convection Oven
no edit summary
-49
Solvent Bench 94
Additional Equipment
Laurell Spinner
no edit summary
-49
Agilent uFTIR Microscope and Bench
Standard operating procedure
-31
Agilent uFTIR Microscope and Bench
no edit summary
-16
Olympus OLS 4000 LEXT
no edit summary
-49
Base Bench 91
no edit summary
-50
Base Bench 91
Checkout procedure
-123
Logitech PM5 Lapper
no edit summary
-186
Logitech PM5 Lapper
no edit summary
-19
Acid Bench 92
Checkout procedure
+128
Acid Bench 92
no edit summary
-49
Heidelberg µPG 501 Mask Maker
no edit summary
-16
Heidelberg µPG 501 Mask Maker
Announcements
-32
Solvent Bench 94
Standard Operating Procedure
-31
Solvent Bench 94
Additional Equipment
Solvent Bench 94
no edit summary
-16
Solvent Bench 94
no edit summary
-20