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- 09:21, 10 March 2022 diff hist -20 CL200 Megasonic Cleaner current
- 09:20, 10 March 2022 diff hist -66 CL200 Megasonic Cleaner
- 09:20, 10 March 2022 diff hist -72 CL200 Megasonic Cleaner
- 14:11, 18 February 2022 diff hist +23 STS APS DGRIE/Processes/LNF Polymer →Etch Rates
- 09:48, 2 February 2022 diff hist -38 NP12 nanoPREP current
- 12:22, 16 December 2021 diff hist 0 Oxford Plasmalab System 100 current
- 09:48, 17 November 2021 diff hist -23 LNF User:LAM 9400 User Processes/XDev sapphire 3 current
- 09:48, 17 November 2021 diff hist -98 LNF User:LAM 9400 User Processes/XDev sapphire 3
- 09:46, 10 November 2021 diff hist +333 Hitachi SU8000 In-line FE-SEM →Checkout Procedure
- 11:04, 8 November 2021 diff hist -2 LAM 9400/Processes/LNF HfO2 →References current
- 11:01, 8 November 2021 diff hist +27 LAM 9400/Processes current
- 16:15, 5 November 2021 diff hist +43 LAM 9400/Processes/LNF HfO2 →Characterization
- 15:14, 5 November 2021 diff hist +85 LAM 9400/Processes/LNF HfO2
- 08:39, 5 November 2021 diff hist +34 LAM 9400/Processes/LNF HfO2 →Etch Rates
- 12:37, 4 November 2021 diff hist +20 LAM 9400/Processes/LNF HfO2 →Main Etch
- 16:48, 2 November 2021 diff hist -3 LAM 9400/Processes/LNF HfO2
- 16:46, 2 November 2021 diff hist +11 LAM 9400/Processes/LNF HfO2
- 16:46, 2 November 2021 diff hist +11 LAM 9400/Processes/LNF HfO2 →Parameters
- 16:45, 2 November 2021 diff hist -1 LAM 9400/Processes/LNF HfO2 →Parameters
- 16:44, 2 November 2021 diff hist -1 LAM 9400/Processes/LNF HfO2 →Etch Rates
- 16:43, 2 November 2021 diff hist +1,521 N LAM 9400/Processes/LNF HfO2 Created page with "<!-- Make sure to add any other relevant categories --> {{Infobox process |technology = RIE |material = HfO2 |mask = Photoresist |gases = BCl<sub>3</sub> |created = October 20..."
- 11:03, 28 October 2021 diff hist 0 Plasmatherm 790 →Supported Processes current
- 10:38, 28 October 2021 diff hist -49 Plasmatherm 790/Processes/L nit350 →Capabilities current
- 10:38, 28 October 2021 diff hist -12 Plasmatherm 790/Processes/L nit350 →Capabilities
- 10:37, 28 October 2021 diff hist -12 Plasmatherm 790/Processes/L nit200 →Capabilities current
- 10:36, 28 October 2021 diff hist +1 Plasmatherm 790/Processes/L ox350 →Capabilities current
- 10:35, 28 October 2021 diff hist -2 Plasmatherm 790/Processes/L ox200 →Capabilities current
- 10:30, 26 October 2021 diff hist -436 GCA AS200 AutoStep →Substrate requirements current
- 10:29, 26 October 2021 diff hist +123 GCA AS200 AutoStep →Capabilities
- 12:41, 20 October 2021 diff hist -115 LAM 9400/Processes/LNF Poly current
- 08:59, 13 October 2021 diff hist +3 Xactix XeF2 current
- 10:20, 12 October 2021 diff hist +27 GCA AS200 AutoStep →Checkout procedure
- 10:19, 12 October 2021 diff hist +171 GCA AS200 AutoStep →Checkout procedure
- 16:04, 4 October 2021 diff hist +53 Plasmatherm 790 →Standard Operating Procedure
- 08:27, 29 September 2021 diff hist -281 GCA AS200 AutoStep
- 08:24, 29 September 2021 diff hist -202 GCA AS200 AutoStep →Standard operating procedure
- 11:02, 28 September 2021 diff hist -440 MJB3-2 current
- 10:51, 28 September 2021 diff hist +185 MA6 Mask Aligner current
- 18:45, 27 September 2021 diff hist +222 MA-BA-6 Mask-Bond Aligner current
- 09:37, 27 September 2021 diff hist +74 LAM 9400 current
- 09:30, 24 September 2021 diff hist +27 LAM 9400 →Hardware Details
- 16:56, 26 August 2021 diff hist +122 GCA AS200 AutoStep →Templates
- 11:03, 18 August 2021 diff hist -59 Plasmatherm 790/Processes/m pary1 →Capabilities current
- 11:02, 18 August 2021 diff hist -249 Plasmatherm 790/Processes/m pary1 →Qualification
- 15:37, 5 August 2021 diff hist -31 SB-6E Bonder →Checkout procedure current
- 15:35, 5 August 2021 diff hist -474 SB-6E Bonder →Maintenance
- 15:32, 5 August 2021 diff hist -104 MJB3-2 →Checkout procedure
- 15:30, 5 August 2021 diff hist +128 MA6 Mask Aligner →Checkout procedure
- 15:29, 5 August 2021 diff hist -181 ACS 200 cluster tool →Checkout procedure
- 15:28, 5 August 2021 diff hist -67 MA-BA-6 Mask-Bond Aligner →Checkout procedure
- 15:27, 5 August 2021 diff hist -121 MA-BA-6 Mask-Bond Aligner →Checkout procedure
- 16:09, 4 August 2021 diff hist -61 GCA AS200 AutoStep →Checkout procedure
- 16:08, 4 August 2021 diff hist 0 GCA AS200 AutoStep →Checkout procedure
- 16:01, 4 August 2021 diff hist -31 Xactix XeF2 →Checkout Procedure
- 09:58, 3 August 2021 diff hist -26 Oxford Plasmalab System 100 →Announcements
- 09:57, 3 August 2021 diff hist -258 Oxford Plasmalab System 100 →Checkout Procedure
- 09:56, 3 August 2021 diff hist -67 LAM 9400 →Checkout Procedure
- 16:42, 30 July 2021 diff hist +420 CEE Developer 1 →Checkout Procedure
- 16:42, 30 July 2021 diff hist +420 CEE Developer 2 →Checkout Procedure
- 12:23, 28 July 2021 diff hist -172 Plasmatherm 790 →Checkout Procedure
- 12:23, 28 July 2021 diff hist -175 LAM 9400 →Checkout Procedure
- 14:09, 27 July 2021 diff hist +89 CEE 200X photoresist spinner 2 →Checkout procedure
- 14:08, 27 July 2021 diff hist +89 CEE 200X photoresist spinner 1 →Checkout procedure
- 14:07, 27 July 2021 diff hist +91 CEE 100CB photoresist spinner →Checkout procedure
- 14:06, 27 July 2021 diff hist +2 CEE Developer 2 →Checkout Procedure
- 14:06, 27 July 2021 diff hist +2 CEE Developer 1 →Checkout Procedure
- 14:06, 27 July 2021 diff hist +86 CEE Developer 1 →Checkout Procedure
- 14:05, 27 July 2021 diff hist +86 CEE Developer 2 →Checkout Procedure
- 14:03, 27 July 2021 diff hist -196 CEE Developer 2 →Checkout Procedure
- 14:03, 27 July 2021 diff hist -127 CEE Developer 1 →Checkout Procedure
- 14:00, 27 July 2021 diff hist +74 CEE 100CB photoresist spinner →Checkout procedure
- 13:59, 27 July 2021 diff hist +183 CEE 200X photoresist spinner 2 →Checkout procedure
- 13:46, 27 July 2021 diff hist +183 CEE 200X photoresist spinner 1 →Checkout procedure
- 13:45, 27 July 2021 diff hist 0 LAM 9400 →Checkout Procedure
- 13:39, 27 July 2021 diff hist -38 CEE 200X photoresist spinner 1
- 08:48, 27 July 2021 diff hist +130 Incident Reports →2021
- 09:16, 26 July 2021 diff hist -271 Xactix XeF2 →Checkout Procedure
- 09:14, 26 July 2021 diff hist +139 Xactix XeF2 →Checkout Procedure
- 23:33, 28 June 2021 diff hist -25 STS APS DGRIE/Processes/LNF Polymer →Etch Rates
- 13:33, 14 June 2021 diff hist -4 LAM 9400 →Checkout Procedure
- 09:03, 3 May 2021 diff hist 0 File:Laurell.jpg Wrightsh uploaded a new version of File:Laurell.jpg current
- 13:27, 30 April 2021 diff hist -36 Laurell Spinner
- 13:26, 30 April 2021 diff hist +90 Laurell Spinner →Checkout procedure
- 13:25, 30 April 2021 diff hist +33 Laurell Spinner →Standard operating procedure
- 13:24, 30 April 2021 diff hist +1 Laurell Spinner
- 18:05, 12 March 2021 diff hist +168 P5000 RIE →Checkout Procedure
- 18:05, 12 March 2021 diff hist +168 STS Pegasus 6 →Checkout Procedure
- 18:04, 12 March 2021 diff hist +168 STS Pegasus 4 →Checkout Procedure
- 18:04, 12 March 2021 diff hist +168 STS APS DGRIE →Checkout procedure
- 18:03, 12 March 2021 diff hist +168 Oxford Plasmalab System 100 →Checkout Procedure
- 18:00, 12 March 2021 diff hist +17 LAM 9400 →Checkout Procedure
- 17:58, 12 March 2021 diff hist +151 LAM 9400 →Checkout Procedure
- 17:18, 12 March 2021 diff hist -289 Sample mounting →Sample mounting handbook
- 10:58, 8 February 2021 diff hist 0 File:51000.jpg Wrightsh uploaded a new version of File:51000.jpg current
- 13:45, 15 December 2020 diff hist +33 LAM 9400/Processes/LNF Al2O3 →Main Etch current
- 13:44, 15 December 2020 diff hist +28 LAM 9400/Processes
- 09:23, 11 December 2020 diff hist -31 SPR 220 →Process current
- 09:23, 11 December 2020 diff hist -62 SPR 220 →Characterization
- 11:37, 10 December 2020 diff hist -22 Plasmatherm 790 →Hardware Details
- 11:39, 7 December 2020 diff hist +67 LAM 9400/Processes/LNF Al2O3
- 11:32, 7 December 2020 diff hist +12 LAM 9400/Processes/LNF Al2O3
- 11:31, 7 December 2020 diff hist +810 N LAM 9400/Processes/LNF Al2O3 Created page with "<!-- Make sure to add any other relevant categories --> {{Infobox process |technology = RIE |material = Al<sub>2</sub>O<sub>3</sub> |mask = Photoresist, SiO<sub>2</sub> |gases..."
- 11:27, 7 December 2020 diff hist +27 LAM 9400/Processes/LNF Aluminum →Break Through current
- 20:05, 22 November 2020 diff hist +99 STS APS DGRIE/Processes →Process List current
- 14:33, 26 October 2020 diff hist +693 N STS APS DGRIE/Processes/LNF Polymer Created page with "<!-- Make sure to add any other relevant categories --> {{Infobox process |technology = RIE |material = Polyimide |mask = Photoresist, SiO<sub>2</sub>, Aluminum |gases = O<sub..."
- 07:44, 30 September 2020 diff hist +2 Xactix XeF2
- 07:43, 30 September 2020 diff hist -34 Xactix XeF2
- 19:34, 9 September 2020 diff hist +109 LAM 9400/Processes/LNF Aluminum →SF6 Ash
- 13:18, 9 September 2020 diff hist +45 LAM 9400/Processes/LNF Aluminum
- 13:15, 9 September 2020 diff hist -19 LAM 9400/Processes/LNF Aluminum →Etch Rates
- 13:15, 9 September 2020 diff hist +542 LAM 9400/Processes/LNF Aluminum →Parameters Tag: Visual edit
- 13:14, 9 September 2020 diff hist +27 N File:Aluminum corrosion on lines.jpg current
- 19:58, 1 September 2020 diff hist 0 Lithography training session Changed redirect target from Optical lithography#Training Modules to Optical lithography#Training modules current Tag: Redirect target changed
- 19:57, 1 September 2020 diff hist 0 Optical lithography →Training Modules
- 19:56, 1 September 2020 diff hist -123 Lithography training session Changed redirect target from Optical lithography#Training to Optical lithography#Training Modules Tag: Redirect target changed
- 19:45, 1 September 2020 diff hist +52 Optical lithography →Training Module
- 19:43, 1 September 2020 diff hist -5 Optical lithography →Training
- 19:38, 1 September 2020 diff hist +44 Lithography training session Redirected page to Optical lithography#Training Tag: New redirect
- 19:36, 1 September 2020 diff hist +302 Optical lithography
- 14:25, 9 April 2020 diff hist +2 SPR 220 7.0 →Bubbles in resist after spinning
- 14:24, 9 April 2020 diff hist +225 SPR 220 7.0 →Bubbles in resist after spinning
- 14:19, 9 April 2020 diff hist 0 SPR 220 7.0 →Process
- 14:17, 9 April 2020 diff hist 0 SPR 220 7.0 →Resist peeling during DRIE
- 14:17, 9 April 2020 diff hist 0 SPR 220 7.0 →Small bubbles form during DRIE
- 14:16, 9 April 2020 diff hist +1 SPR 220 7.0 →Characterization
- 14:16, 9 April 2020 diff hist -19 SPR 220 7.0 →Characterization
- 14:15, 9 April 2020 diff hist -1 SPR 220 7.0 →Softbake
- 14:15, 9 April 2020 diff hist -145 SPR 220 7.0 →Softbake
- 14:14, 9 April 2020 diff hist 0 N File:SPR 220 10um thickness vs bake time.png current
- 09:16, 7 April 2020 diff hist -1 m Optical lithography →Exposure
- 09:16, 7 April 2020 diff hist +48 m Optical lithography →Equipment
- 08:41, 7 April 2020 diff hist -11 GCA AS200 AutoStep
- 13:33, 3 April 2020 diff hist -83 Parylene C
- 13:30, 3 April 2020 diff hist 0 Parylene C
- 13:30, 3 April 2020 diff hist +281 N File:Parylene C repeat unit.svg == Summary == {{Information | Description= Chemical structure of Parylene N repeat unit | Source= mediawiki commons | Date= 2020-04-3 | Author= Wrightsh (talk) | Permission= {{PD-chem}} | other_versions= }} Category:Chemical structures current
- 13:12, 3 April 2020 diff hist +16 PDMS
- 10:50, 3 April 2020 diff hist +55 Parylene C →Etching
- 10:48, 3 April 2020 diff hist +447 Parylene C →Processes
- 10:32, 3 April 2020 diff hist +250 N File:Crotonic acid.svg == Summary == {{Information | Description= Crotonic acid | Source= mediawiki commons | Date= 2020-04-3 | Author= Wrightsh (talk) | Permission= {{PD-chem}} | other_versions= }} Category:Chemical structures current
- 10:30, 3 April 2020 diff hist 0 N File:PD-icon.svg current
- 10:26, 3 April 2020 diff hist +1 Parylene C
- 10:22, 3 April 2020 diff hist +10 File:Parylene N repeat unit.svg current
- 10:20, 3 April 2020 diff hist -310 File:Parylene N repeat unit.svg →Comments
- 10:19, 3 April 2020 diff hist 0 m Module:Unsubst 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Module:Transclusion count 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Module:Transclusion count/data/I 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Module:Section link 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Module:High-use 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:\sandbox 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:Section link 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:Ombox 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:Information/doc 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:High-risk 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:High-use 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:Image other 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:Information 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:Description missing 1 revision imported current
- 10:16, 3 April 2020 diff hist +581 N File:Parylene N repeat unit.svg {{Information | Description= {{en|Chemical structure of en:...}} | Source= {{Own}} | Date= 2020-04-3 | Author= ~~~ | Permission= {{PD-chem}} | other_versions= }} == Comments == High-resolution black/white .SVG made with ChemDraw and IrfanView — see WikiProject Chemistry - structure drawing for detailed instructions. Please drop me a note if you need the source file. [[Category:Chemical...
- 10:13, 3 April 2020 diff hist 0 m Module:Yesno 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Side box 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:String 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Protection banner 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Protection banner/config 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Namespace detect/data 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:No globals 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Message box/configuration 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Namespace detect/config 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Message box 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:File link 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Effective protection expiry 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Effective protection level 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Documentation 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Documentation/config 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Category handler/shared 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Check for unknown parameters 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Category handler/config 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Category handler/data 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Category handler 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Category handler/blacklist 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Template parameter usage 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Tl 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Yesno 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Yesno-no 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Module:Arguments 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Sandbox other 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Side box 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Sister project 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:TemplateDataHeader 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:TemplateData header 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Template error report 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Template other 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Documentation subpage 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Imbox 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:In category 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:PD-ineligible/doc 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:PD-chem 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Category link 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Cl 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Commons 1 revision imported current
- 10:13, 3 April 2020 diff hist 0 m Template:Documentation 1 revision imported current
- 10:14, 2 April 2020 diff hist +28 PDMS →Etching
- 10:08, 2 April 2020 diff hist 0 PDMS →Etching
- 09:47, 2 April 2020 diff hist +452 PDMS →Processing Equipment
- 11:58, 1 April 2020 diff hist -109 Optical lithography →Hard bake
- 10:54, 1 April 2020 diff hist 0 Optical lithography →Figures of Merit
- 12:49, 30 March 2020 diff hist -786 m Optical lithography →Plasma descum
- 12:46, 30 March 2020 diff hist -409 m Optical lithography →Hard bake
- 12:44, 30 March 2020 diff hist -3 m Optical lithography →Development
- 12:43, 30 March 2020 diff hist -57 m Optical lithography →Softbake
- 11:27, 30 March 2020 diff hist -12 m Optical lithography →Development
- 11:24, 30 March 2020 diff hist -58 Optical lithography
- 11:24, 30 March 2020 diff hist -2 Optical lithography →Exposure tool selection
- 11:23, 30 March 2020 diff hist -133 Optical lithography →Exposure tool selection
- 10:49, 30 March 2020 diff hist -37 m Optical lithography
- 10:46, 30 March 2020 diff hist +27 Optical lithography
- 10:44, 30 March 2020 diff hist +27 Optical lithography →Equipment
- 14:10, 27 March 2020 diff hist 0 m PDMS Processing Wrightsh moved page LNF Wiki:PDMS to PDMS Processing without leaving a redirect: Pilar
- 09:42, 25 March 2020 diff hist +241 SPR 220 7.0 →Process
- 09:28, 25 March 2020 diff hist +1 m SPR 220 7.0
- 15:46, 10 March 2020 diff hist -62 Plasmatherm 790/Processes/L ox350R current
- 15:45, 10 March 2020 diff hist -35 Plasmatherm 790/Processes/L ox350
- 15:45, 10 March 2020 diff hist -245 Plasmatherm 790/Processes/L ox350
- 15:45, 10 March 2020 diff hist -282 Plasmatherm 790/Processes/L nit350
- 15:44, 10 March 2020 diff hist -282 Plasmatherm 790/Processes/L nit200
- 12:00, 10 March 2020 diff hist -25 Optical lithography
- 12:00, 10 March 2020 diff hist -2,473 Optical lithography →Methods of operation
- 11:23, 10 March 2020 diff hist +4 Optical lithography →Exposure tool selection
- 11:21, 10 March 2020 diff hist +261 Optical lithography →Selection of type of optical lithography
- 10:14, 28 February 2020 diff hist -17 LNF User:LAM 9400 User Processes/Vik GaN BCl3 Cl2 current
- 10:14, 28 February 2020 diff hist -24 LNF User:LAM 9400 User Processes/Vik GaN BCl3 Cl2 →Capabilities
- 11:10, 26 February 2020 diff hist -4 ACS 200 cluster tool →Supported processes
- 11:09, 26 February 2020 diff hist -240 ACS 200 cluster tool
- 11:09, 26 February 2020 diff hist +20 ACS 200 cluster tool
- 12:58, 25 February 2020 diff hist 0 SB-6E Bonder →System overview
- 12:58, 25 February 2020 diff hist +12 SB-6E Bonder
- 12:57, 25 February 2020 diff hist -16 Substrate bonding
- 12:52, 25 February 2020 diff hist 0 Plasmatherm 790/Processes/L ox200
- 12:52, 25 February 2020 diff hist +1 Plasmatherm 790/Processes/L ox200
- 12:51, 25 February 2020 diff hist -275 Plasmatherm 790/Processes/L ox200
- 12:50, 25 February 2020 diff hist -44 Plasmatherm 790/Processes →PECVD current
- 12:47, 25 February 2020 diff hist -78 Plasmatherm 790
- 12:40, 25 February 2020 diff hist -2 Optical lithography →Exposure
- 12:39, 25 February 2020 diff hist -14 Optical lithography →Exposure
- 12:36, 25 February 2020 diff hist -19 ACS 200 cluster tool
- 12:35, 25 February 2020 diff hist 0 m Optical lithography →Photoresist Spinning
- 12:35, 25 February 2020 diff hist +8 Optical lithography →Photoresist Spinning
- 12:34, 25 February 2020 diff hist 0 Optical lithography →Photoresist Spinning
- 12:34, 25 February 2020 diff hist +12 Optical lithography →HMDS
- 12:33, 25 February 2020 diff hist +2 Optical lithography →Equipment
- 12:32, 25 February 2020 diff hist -826 Optical lithography
- 12:18, 25 February 2020 diff hist -7 Optical lithography Tag: Visual edit: Switched
- 11:42, 25 February 2020 diff hist -393 LAM 9400
- 11:39, 25 February 2020 diff hist -103 LAM 9400
- 15:01, 9 December 2019 diff hist +34 Deep UV SenLights PL16 current
- 19:06, 6 December 2019 diff hist +192 Deep UV SenLights PL16 →Fully cross-link SPR 955
- 19:05, 6 December 2019 diff hist +1 Deep UV SenLights PL16 →Improve Wet Etch Undercut
- 19:04, 6 December 2019 diff hist +92 Deep UV SenLights PL16 →Improve Wet Etch Undercut
- 18:58, 6 December 2019 diff hist +33 Deep UV SenLights PL16
- 18:51, 6 December 2019 diff hist +62 Deep UV SenLights PL16 →Capabilities
- 18:50, 6 December 2019 diff hist 0 Deep UV SenLights PL16 →Process Info
- 18:49, 6 December 2019 diff hist +67 Deep UV SenLights PL16 →Improve Wet Etch Undercut
- 18:47, 6 December 2019 diff hist +72 N File:BHF SiO2 Etch Undercut SPR 955 DUV.jpg 15min BHF etch of SiO2 with SPR 955 mask, 5min in DUV tool current
- 18:44, 6 December 2019 diff hist +1 Deep UV SenLights PL16 →Capabilities
- 12:20, 4 December 2019 diff hist +1 Deep UV SenLights PL16 →Fully cross-link SPR 955
- 12:08, 4 December 2019 diff hist -1 m Deep UV SenLights PL16 →Fully cross-link SPR 955
- 12:08, 4 December 2019 diff hist +206 Deep UV SenLights PL16 →Fully cross-link SPR 955
- 12:05, 4 December 2019 diff hist +73 Deep UV SenLights PL16 →Fully cross-link SPR 955
- 12:04, 4 December 2019 diff hist +124 N File:SPR 955 Litho Cure Litho 2.jpeg SPR 955 patterned, then 5 min DUV exposure, 180C 30 min bake, then a second layer of SPR 955 patterned on top. current
- 12:03, 4 December 2019 diff hist +124 N File:SPR 955 Litho Cure Litho.jpeg SPR 955 patterned, then 5 min DUV exposure, 180C 30 min bake, then a second layer of SPR 955 patterned on top. current
- 11:50, 4 December 2019 diff hist 0 Deep UV SenLights PL16 →Etch Rate
- 11:48, 4 December 2019 diff hist +75 Deep UV SenLights PL16
- 17:02, 26 November 2019 diff hist +115 LAM 9400/Processes/LNF Poly
- 13:55, 1 November 2019 diff hist 0 Deep UV SenLights PL16
- 16:03, 25 October 2019 diff hist +8 m Deep UV SenLights PL16 →Qualification
- 13:46, 25 October 2019 diff hist +113 Deep UV SenLights PL16 →Checkout procedure
- 13:03, 25 October 2019 diff hist -31 Material restrictions
- 12:41, 25 October 2019 diff hist 0 Deep UV SenLights PL16
- 09:58, 25 October 2019 diff hist +424 Material restrictions
- 09:16, 25 October 2019 diff hist -2 Deep UV SenLights PL16 →Material restrictions
- 09:27, 22 October 2019 diff hist -101 ACS 200 cluster tool
- 14:56, 18 October 2019 diff hist -38 Plasmatherm 790/Processes/m si o 1 →Capabilities current
- 13:42, 14 October 2019 diff hist +522 Deep UV SenLights PL16
- 13:25, 14 October 2019 diff hist -26 Deep UV SenLights PL16
- 13:24, 14 October 2019 diff hist +171 Deep UV SenLights PL16
- 13:17, 14 October 2019 diff hist 0 m Deep UV SenLights PL16 →Substrate requirements
- 13:17, 14 October 2019 diff hist +70 Deep UV SenLights PL16 →Capabilities
- 22:06, 8 October 2019 diff hist 0 Deep UV SenLights PL16
- 22:06, 8 October 2019 diff hist -24 Deep UV SenLights PL16
- 22:05, 8 October 2019 diff hist -60 Deep UV SenLights PL16
- 22:01, 8 October 2019 diff hist 0 N File:59000.jpg current
- 22:00, 8 October 2019 diff hist +1 Deep UV SenLights PL16
- 10:10, 7 October 2019 diff hist +87 CEE 200X photoresist spinner 2 →Capabilities
- 10:10, 7 October 2019 diff hist +87 CEE 200X photoresist spinner 1 →Capabilities
- 15:45, 2 October 2019 diff hist -49 LAM 9400/Processes/LNF Poly
- 12:04, 2 October 2019 diff hist 0 Deep UV SenLights PL16
- 12:04, 2 October 2019 diff hist 0 m Deep UV SenLights PL16 Wrightsh moved page SenLights DUV PL16 to Deep UV SenLights PL16 without leaving a redirect
- 14:50, 1 October 2019 diff hist +1 Deep UV SenLights PL16
- 14:50, 1 October 2019 diff hist +56 Deep UV SenLights PL16
- 14:49, 1 October 2019 diff hist +1,483 N Deep UV SenLights PL16 Created page with "{{#vardefine:toolid|?????}} {{#vardefine:technology|Lithography}} {{#vardefine:restriction|3}} {{infobox equipment |caption = |materials = Photoresist |mask = |size = pie..."
- 10:58, 30 September 2019 diff hist +166 GCA AS200 AutoStep →Templates
- 16:15, 23 September 2019 diff hist 0 Incident Reports →2019
- 16:14, 23 September 2019 diff hist +153 Incident Reports →2019
- 14:36, 17 September 2019 diff hist -26 LAM 9400
- 11:19, 16 September 2019 diff hist +107 GCA AS200 AutoStep →Templates
- 08:31, 13 September 2019 diff hist -523 GCA AS200 AutoStep →Maintenance
- 08:30, 13 September 2019 diff hist -118 GCA AS200 AutoStep →Capabilities
- 08:25, 13 September 2019 diff hist -401 GCA AS200 AutoStep →Announcements
- 13:09, 12 September 2019 diff hist -1 SPR 955 →Isolated Trenches
- 13:08, 12 September 2019 diff hist 0 File:1000nm trenches low reflection.jpg Wrightsh uploaded a new version of File:1000nm trenches low reflection.jpg current
- 13:08, 12 September 2019 diff hist 0 File:500nm trenches low reflection.jpg Wrightsh uploaded a new version of File:500nm trenches low reflection.jpg current
- 13:07, 12 September 2019 diff hist 0 File:400nm trenches low reflection.jpg Wrightsh uploaded a new version of File:400nm trenches low reflection.jpg current
- 13:07, 12 September 2019 diff hist 0 File:350nm trenches low reflection.jpg Wrightsh uploaded a new version of File:350nm trenches low reflection.jpg current
- 13:06, 12 September 2019 diff hist +1 SPR 955 →Isolated Lines
- 13:01, 12 September 2019 diff hist 0 File:1000nm lines low reflection.jpg Wrightsh uploaded a new version of File:1000nm lines low reflection.jpg current
- 13:00, 12 September 2019 diff hist 0 File:500nm lines low reflection.jpg Wrightsh uploaded a new version of File:500nm lines low reflection.jpg current
- 12:59, 12 September 2019 diff hist 0 File:400nm lines low reflection.jpg Wrightsh uploaded a new version of File:400nm lines low reflection.jpg current
- 12:59, 12 September 2019 diff hist 0 File:350nm lines low reflection.jpg Wrightsh uploaded a new version of File:350nm lines low reflection.jpg current
- 12:58, 12 September 2019 diff hist +1 SPR 955 →Gratings
- 12:57, 12 September 2019 diff hist 0 File:1000nm gratings low reflection.jpg Wrightsh uploaded a new version of File:1000nm gratings low reflection.jpg current
- 12:56, 12 September 2019 diff hist 0 File:500nm gratings low reflection.jpg Wrightsh uploaded a new version of File:500nm gratings low reflection.jpg current
- 12:55, 12 September 2019 diff hist 0 File:400nm gratings low reflection.jpg Wrightsh uploaded a new version of File:400nm gratings low reflection.jpg current
- 12:54, 12 September 2019 diff hist 0 File:350nm gratings low reflection.jpg Wrightsh uploaded a new version of File:350nm gratings low reflection.jpg current
- 21:49, 11 September 2019 diff hist +44 SPR 955 →Low Reflection Substrate
- 21:48, 11 September 2019 diff hist +149 SPR 955 →Low Reflection Substrate
- 21:46, 11 September 2019 diff hist +26 SPR 955
- 21:43, 11 September 2019 diff hist +186 SPR 955 →Isolated Lines
- 21:40, 11 September 2019 diff hist +1 SPR 955 →Silicon
- 21:40, 11 September 2019 diff hist +10 SPR 955 →Process
- 21:39, 11 September 2019 diff hist +8 SPR 955 →Process
- 21:39, 11 September 2019 diff hist +15 SPR 955 →Process
- 21:37, 11 September 2019 diff hist -1 SPR 955 →Gratings
- 21:37, 11 September 2019 diff hist +272 N File:1000nm gratings low reflection.jpg Stepper exposure matrix failed 1000nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, A...
- 21:36, 11 September 2019 diff hist +264 N File:500nm gratings low reflection.jpg Stepper exposure matrix 500nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25...
- 21:36, 11 September 2019 diff hist +264 N File:400nm gratings low reflection.jpg Stepper exposure matrix 400nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25...
- 21:36, 11 September 2019 diff hist +271 N File:350nm gratings low reflection.jpg Stepper exposure matrix failed 350nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ...
- 21:34, 11 September 2019 diff hist +399 SPR 955 →Gratings
- 21:32, 11 September 2019 diff hist +202 SPR 955 →Isolated Trenches
- 21:32, 11 September 2019 diff hist +256 N File:1000nm trenches low reflection.jpg Stepper exposure matrix 1000nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS dev...
- 21:31, 11 September 2019 diff hist +255 N File:500nm trenches low reflection.jpg Stepper exposure matrix 500nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:31, 11 September 2019 diff hist +255 N File:400nm trenches low reflection.jpg Stepper exposure matrix 400nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:31, 11 September 2019 diff hist +255 N File:350nm trenches low reflection.jpg Stepper exposure matrix 350nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:26, 11 September 2019 diff hist +4 SPR 955 →Isolated Lines
- 21:24, 11 September 2019 diff hist +253 N File:1000nm lines low reflection.jpg Stepper exposure matrix 1000nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:24, 11 September 2019 diff hist +187 SPR 955 →Isolated Lines
- 21:23, 11 September 2019 diff hist 0 File:400nm lines low reflection.jpg Wrightsh uploaded a new version of File:400nm lines low reflection.jpg
- 21:19, 11 September 2019 diff hist 0 File:500nm lines low reflection.jpg Wrightsh uploaded a new version of File:500nm lines low reflection.jpg
- 21:16, 11 September 2019 diff hist 0 File:400nm lines low reflection.jpg Wrightsh uploaded a new version of File:400nm lines low reflection.jpg
- 21:13, 11 September 2019 diff hist +255 N File:500nm lines low reflection.jpg Stepper exposure matrix 500nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:13, 11 September 2019 diff hist +255 N File:400nm lines low reflection.jpg Stepper exposure matrix 400nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:13, 11 September 2019 diff hist +255 N File:350nm lines low reflection.jpg Stepper exposure matrix 350nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:08, 11 September 2019 diff hist +825 SPR 955
- 12:52, 8 August 2019 diff hist +1 Plasmatherm 790/Processes/L oxy350 current
- 11:34, 7 August 2019 diff hist +1 Plasmatherm 790/Processes
- 11:33, 7 August 2019 diff hist -131 Plasmatherm 790/Processes/L oxy350
- 11:31, 7 August 2019 diff hist +48 N Plasmatherm 790/Processes/L on350 Wrightsh moved page Plasmatherm 790/Processes/L on350 to Plasmatherm 790/Processes/L oxy350 current
- 11:31, 7 August 2019 diff hist 0 m Plasmatherm 790/Processes/L oxy350 Wrightsh moved page Plasmatherm 790/Processes/L on350 to Plasmatherm 790/Processes/L oxy350
- 22:05, 2 July 2019 diff hist +36 LAM 9400/Processes →Proccess List
- 11:08, 2 July 2019 diff hist -1 LAM 9400/Processes/LNF TiN sel Al2O3 current
- 11:07, 2 July 2019 diff hist +118 LAM 9400/Processes/LNF TiN sel Al2O3 →Etch Profile
- 11:06, 2 July 2019 diff hist -57 LAM 9400/Processes/LNF TiN sel Al2O3 →Etch Profile
- 11:06, 2 July 2019 diff hist +123 N File:LAM 9400 TiN sel Al2O3.jpg 27nm of Veeco TiN on Si, patterned with SPR 955, etched in the LAM 9400 for 20 seconds (~15sec of overetch), 500nm grating. current
- 10:30, 2 July 2019 diff hist +1,159 N LAM 9400/Processes/LNF TiN sel Al2O3 Created page with "<!-- Make sure to add any other relevant categories --> {{Infobox process |technology = RIE |material = TiN, Ti |mask = Photoresist, SiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</su..."
- 08:57, 14 May 2019 diff hist +10 Incident Reports →2019
- 08:56, 14 May 2019 diff hist -8 Incident Reports →2019
- 08:56, 14 May 2019 diff hist +8 Incident Reports →2019
- 08:48, 14 May 2019 diff hist 0 Incident Reports →2019
- 08:31, 14 May 2019 diff hist -18 Incident Reports
- 08:30, 14 May 2019 diff hist +99 Incident Reports →2019
- 08:13, 14 May 2019 diff hist +99 Incident Reports →2019
- 08:12, 14 May 2019 diff hist +116 Incident Reports →2019
- 17:37, 6 March 2019 diff hist +1 Plasmatherm 790 →Hardware Details
- 17:37, 6 March 2019 diff hist +5 Plasmatherm 790 →System Overview
- 11:14, 7 January 2019 diff hist +3 SPR 220 →Process
- 16:44, 18 December 2018 diff hist +31 LAM 9400/Processes →Proccess List
- 10:37, 18 December 2018 diff hist +73 LAM 9400/Processes/LNF Aluminum →Etch Rates
- 10:30, 18 December 2018 diff hist +10 LAM 9400/Processes/LNF Aluminum
- 10:29, 18 December 2018 diff hist -5 LAM 9400/Processes/LNF Aluminum →Etch Rates
- 10:28, 18 December 2018 diff hist +30 LAM 9400/Processes/LNF Aluminum →Etch Profile
- 10:27, 18 December 2018 diff hist +15 LAM 9400/Processes/LNF Aluminum →Etch Profile
- 10:25, 18 December 2018 diff hist +160 LAM 9400/Processes/LNF Aluminum
- 10:25, 18 December 2018 diff hist +29 N File:LAM 9400 Aluminum 700nm.png LNF_Aluminum Etch in LAM 9400 current
- 10:25, 18 December 2018 diff hist +29 N File:LAM 9400 Aluminum 3000nm.png LNF_Aluminum Etch in LAM 9400 current
- 10:24, 18 December 2018 diff hist +29 N File:LAM 9400 Aluminum 500nm.png LNF_Aluminum Etch in LAM 9400 current
- 10:17, 18 December 2018 diff hist +1 LAM 9400/Processes/LNF Aluminum
- 10:17, 18 December 2018 diff hist +2 LAM 9400/Processes/LNF Aluminum
- 10:15, 18 December 2018 diff hist +34 LAM 9400/Processes/LNF Aluminum →Parameters
- 10:13, 18 December 2018 diff hist +3 LAM 9400/Processes/LNF Aluminum →Parameters
- 10:12, 18 December 2018 diff hist +1,138 N LAM 9400/Processes/LNF Aluminum Created page with "<!-- Make sure to add any other relevant categories --> {{Infobox process |technology = RIE |material = Aluminum |mask = PR |gases = BCl<sub>3</sub>, HBr |crea..."
- 10:01, 12 December 2018 diff hist +325 SPR 220
- 15:18, 25 October 2018 diff hist +242 CEE 200X photoresist spinner 1 →Capabilities
- 09:40, 9 October 2018 diff hist +62 September 2018 water damage →Equipment status
- 09:33, 9 October 2018 diff hist +50 September 2018 water damage →Equipment status
- 08:58, 5 October 2018 diff hist -1 September 2018 water damage →Equipment status
- 08:51, 5 October 2018 diff hist -34 September 2018 water damage →Equipment status
- 13:03, 2 October 2018 diff hist +33 September 2018 water damage →Equipment status
- 11:22, 12 September 2018 diff hist 0 SPR 220 →Process
- 11:22, 12 September 2018 diff hist -1 SPR 220 →3µm - SPR 220 (3.0)
- 19:57, 11 September 2018 diff hist +186 SPR 220
- 19:53, 11 September 2018 diff hist -186 SPR 220
- 19:50, 11 September 2018 diff hist +2 SPR 220
- 19:46, 11 September 2018 diff hist +3 SPR 220 →3µm - SPR 220 (3.0)
- 19:42, 11 September 2018 diff hist +1 SPR 220 →3µm - SPR 220 (3.0)
- 19:42, 11 September 2018 diff hist 0 SPR 220 →3µm - SPR 220 (3.0)
- 19:42, 11 September 2018 diff hist +5 SPR 220 →Stepper
- 19:41, 11 September 2018 diff hist +146 SPR 220 →Characterization
- 19:41, 11 September 2018 diff hist 0 N File:SPR220 3um develop time.jpg current
- 19:39, 11 September 2018 diff hist +73 SPR 220 →Stepper
- 19:39, 11 September 2018 diff hist 0 N File:SPR220 3um stepper focus.jpg current
- 19:35, 11 September 2018 diff hist 0 SPR 220 →Process
- 19:34, 11 September 2018 diff hist +2 SPR 220 →Process
- 19:33, 11 September 2018 diff hist +19 SPR 220 →3µm - SPR 220 (3.0)
- 19:29, 11 September 2018 diff hist 0 SPR 220 →3µm - SPR 220 (3.0)
- 19:26, 11 September 2018 diff hist +2 SPR 220
- 19:26, 11 September 2018 diff hist +53 SPR 220 →Contact Aligner
- 19:25, 11 September 2018 diff hist 0 N File:SPR220 3um aligner grating silicon.jpg current
- 19:24, 11 September 2018 diff hist +77 SPR 220 →Contact Aligner
- 19:22, 11 September 2018 diff hist +27 SPR 220 →Stepper
- 19:17, 11 September 2018 diff hist +126 SPR 220 →3µm - SPR 220 (3.0)
- 19:14, 11 September 2018 diff hist +38 SPR 220 →Characterization
- 19:14, 11 September 2018 diff hist +3 SPR 220 →Stepper
- 19:13, 11 September 2018 diff hist -5 SPR 220
- 19:11, 11 September 2018 diff hist 0 SPR 220 →Characterization
- 19:11, 11 September 2018 diff hist -12 SPR 220
- 19:10, 11 September 2018 diff hist -2,446 SPR 220 →Processes
- 10:29, 11 September 2018 diff hist +779 SPR 220
- 10:29, 11 September 2018 diff hist 0 N File:SPR220 3um stepper trench 700nm.jpg current
- 10:28, 11 September 2018 diff hist 0 N File:SPR220 3um stepper trench 1um.jpg current
- 10:28, 11 September 2018 diff hist 0 N File:SPR220 3um stepper grating low reflection.jpg current
- 10:27, 11 September 2018 diff hist 0 N File:SPR220 3um stepper grating aluminum.jpg current
- 10:26, 11 September 2018 diff hist 0 N File:SPR220 3um stepper grating silicon.jpg current
- 16:00, 8 August 2018 diff hist -162 Plasmatherm 790
- 15:59, 8 August 2018 diff hist +241 Plasmatherm 790 →Standard Operating Procedure
- 14:22, 20 July 2018 diff hist -21 Octafluorocyclobutane →Equipment current
- 16:07, 26 June 2018 diff hist +179 SPR 955 →Processes
- 11:36, 26 June 2018 diff hist -1 Photoresist →LNF Supported Photoresists
- 11:36, 26 June 2018 diff hist +143 Photoresist →LNF Supported Photoresists
- 11:29, 26 June 2018 diff hist +125 Photoresist →LNF Supported Photoresists
- 11:24, 26 June 2018 diff hist -649 Photoresist
- 10:59, 26 June 2018 diff hist -406 Photoresist
- 10:23, 26 June 2018 diff hist -29 Photoresist →Deposition
- 10:20, 26 June 2018 diff hist +94 Photoresist →Wet Etch
- 10:12, 26 June 2018 diff hist +16 Photoresist →Applications
- 10:01, 26 June 2018 diff hist +4 Photoresist →RIE
- 10:01, 26 June 2018 diff hist +408 Photoresist
- 09:54, 26 June 2018 diff hist +1,249 Photoresist
- 15:56, 25 June 2018 diff hist +1 LAM 9400/Processes/LNF Ti thin →Etch Rates current
- 15:54, 25 June 2018 diff hist +22 LAM 9400/Processes/LNF Ti thin →Etch Rates
- 15:25, 19 June 2018 diff hist 0 LAM 9400/Processes/LNF Ti thin
- 15:24, 19 June 2018 diff hist +48 LAM 9400/Processes/LNF Ti thin →Etch Rates
- 15:21, 19 June 2018 diff hist +803 N LAM 9400/Processes/LNF Ti thin Created page with "<!-- Make sure to add any other relevant categories --> {{Infobox process |technology = RIE |material = Titanium |mask = PR |gases = SF<sub>6</sub>, C<sub>4</s..."
- 15:15, 19 June 2018 diff hist +30 LAM 9400/Processes →Proccess List
- 09:27, 1 June 2018 diff hist +3 SPR 955 →SPR 955 (0.97µm)
- 09:26, 1 June 2018 diff hist +99 SPR 955 →SPR 955 (0.97µm)
- 09:05, 1 June 2018 diff hist +3 SPR 955 →SPR 955 (0.97µm)
- 16:07, 27 May 2018 diff hist +547 N LNF User:LAM 9400 User Processes/XDev Cr Created page with "{{Infobox process |equipment = LAM 9400 |technology = RIE |material = Chrome |mask = SiO<sub>2</sub>, Photoresist |gases = Cl<sub>2</sub>Oxygen..."
- 16:04, 27 May 2018 diff hist +55 LNF User:LAM 9400 User Processes →User Recipes current
- 12:23, 25 May 2018 diff hist +2 LNF User:LAM 9400 User Processes →User Recipes
- 12:23, 25 May 2018 diff hist +62 N LNF User:LAM 9400 User Processes/XDev sapphire Wrightsh moved page LNF User:LAM 9400 User Processes/XDev sapphire to LNF User:LAM 9400 User Processes/XDev sapphire 3 current
- 12:23, 25 May 2018 diff hist 0 m LNF User:LAM 9400 User Processes/XDev sapphire 3 Wrightsh moved page LNF User:LAM 9400 User Processes/XDev sapphire to LNF User:LAM 9400 User Processes/XDev sapphire 3
- 12:22, 25 May 2018 diff hist -47 LNF User:LAM 9400 User Processes/XDev sapphire 3 →Etch Rates
- 12:22, 25 May 2018 diff hist 0 LNF User:LAM 9400 User Processes/XDev sapphire 3 →Parameters
- 12:22, 25 May 2018 diff hist +45 LNF User:LAM 9400 User Processes/XDev sapphire 3 →Etch Rates
- 12:21, 25 May 2018 diff hist +59 LNF User:LAM 9400 User Processes/Vik GaN BCl3 Cl2 →Mask Selectivity
- 11:27, 16 May 2018 diff hist +100 Plasmatherm 790/Processes →PECVD
- 12:40, 3 May 2018 diff hist +438 SPR 955 →Process Curves
- 12:36, 3 May 2018 diff hist +124 N File:Stepper 500nm Grating SPR 955 0.97µm CD Loss vs Defocus.png This shows the CD loss of a 500nm grating in the stepper in SPR 955 0.97µm. Much beyond 1µm and the pattern wont resolve. current
- 14:49, 2 May 2018 diff hist +1 SPR 955 →Processes
- 14:48, 2 May 2018 diff hist +81 SPR 955
- 14:45, 2 May 2018 diff hist +7 SPR 955 →Processes
- 14:45, 2 May 2018 diff hist -92 SPR 955 →SPR 955 (0.97µm)
- 14:44, 2 May 2018 diff hist +395 SPR 955 →Processes
- 13:29, 2 May 2018 diff hist -253 SPR 955 →Process Curves
- 13:29, 2 May 2018 diff hist +93 File:SPR 955 0.97µm CD Loss vs Exposure.png current
- 13:27, 2 May 2018 diff hist 0 File:SPR 955 0.97µm CD Loss vs Exposure.png Wrightsh uploaded a new version of File:SPR 955 0.97µm CD Loss vs Exposure.png
- 13:22, 2 May 2018 diff hist +6 SPR 955 →Process Curves
- 13:21, 2 May 2018 diff hist -137 SPR 955 →Process Curves
- 13:21, 2 May 2018 diff hist 0 N File:SPR 955 0.97µm CD Loss vs Exposure.png
- 09:14, 1 May 2018 diff hist +1 LNF User:LAM 9400 User Processes/Vik GaN BCl3 Cl2 →Etch Rate
- 09:13, 1 May 2018 diff hist +68 LNF User:LAM 9400 User Processes/Vik GaN BCl3 Cl2 →Etch Rate
- 09:11, 1 May 2018 diff hist 0 N File:Vik GaN etchratefit.png current
- 08:28, 25 April 2018 diff hist -2 LNF User:LAM 9400 User Processes/Vik GaN BCl3 Cl2
- 13:09, 13 April 2018 diff hist -43 GCA AS200 AutoStep
- 13:07, 13 April 2018 diff hist +101 GCA AS200 AutoStep →Standard operating procedure
- 16:39, 26 March 2018 diff hist +74 Plasmatherm 790/Processes/L oxy350 →Capabilities
- 16:39, 26 March 2018 diff hist +74 Plasmatherm 790/Processes/L nit350 →Capabilities
- 16:39, 26 March 2018 diff hist +74 Plasmatherm 790/Processes/L nit200 →Capabilities
- 16:39, 26 March 2018 diff hist +75 Plasmatherm 790/Processes/L ox350R →Capabilities
- 16:38, 26 March 2018 diff hist +75 Plasmatherm 790/Processes/L ox350 →Capabilities
- 16:38, 26 March 2018 diff hist +74 Plasmatherm 790/Processes/L ox200 →Capabilities
- 08:22, 26 March 2018 diff hist +138 GCA AS200 AutoStep →Checkout procedure
- 11:18, 20 March 2018 diff hist +759 N LNF User:LAM 9400 User Processes/tsenguun polysi Created page with "{{Infobox process |equipment = LAM 9400 |technology = RIE |material = Si |created=??? |modified = }} Category:Processes Category:RIE This etch is d..." current
- 11:11, 20 March 2018 diff hist +71 LNF User:LAM 9400 User Processes →User Recipes
- 11:40, 15 February 2018 diff hist -514 Plasmatherm 790/Processes/m si o 1 →Qualification
- 14:41, 18 January 2018 diff hist -2 GCA AS200 AutoStep →Templates
- 14:41, 18 January 2018 diff hist +99 GCA AS200 AutoStep →Templates
- 09:18, 16 January 2018 diff hist +138 MA-BA-6 Mask-Bond Aligner →Checkout procedure
- 10:20, 13 December 2017 diff hist -174 MA-BA-6 Mask-Bond Aligner Undo revision 14580 by Wrightsh (talk)
- 10:17, 13 December 2017 diff hist +342 GCA AS200 AutoStep →Standard operating procedure
- 11:01, 30 November 2017 diff hist +174 MA-BA-6 Mask-Bond Aligner →Standard operating procedure
- 18:06, 9 November 2017 diff hist +67 LNF User:LAM 9400 User Processes →User Recipes
