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- 11:32, 7 December 2020 diff hist +12 LAM 9400/Processes/LNF Al2O3
- 11:31, 7 December 2020 diff hist +810 N LAM 9400/Processes/LNF Al2O3 Created page with "<!-- Make sure to add any other relevant categories --> {{Infobox process |technology = RIE |material = Al<sub>2</sub>O<sub>3</sub> |mask = Photoresist, SiO<sub>2</sub> |gases..."
- 11:27, 7 December 2020 diff hist +27 LAM 9400/Processes/LNF Aluminum →Break Through current
- 20:05, 22 November 2020 diff hist +99 STS APS DGRIE/Processes →Process List current
- 14:33, 26 October 2020 diff hist +693 N STS APS DGRIE/Processes/LNF Polymer Created page with "<!-- Make sure to add any other relevant categories --> {{Infobox process |technology = RIE |material = Polyimide |mask = Photoresist, SiO<sub>2</sub>, Aluminum |gases = O<sub..."
- 07:44, 30 September 2020 diff hist +2 Xactix XeF2
- 07:43, 30 September 2020 diff hist -34 Xactix XeF2
- 19:34, 9 September 2020 diff hist +109 LAM 9400/Processes/LNF Aluminum →SF6 Ash
- 13:18, 9 September 2020 diff hist +45 LAM 9400/Processes/LNF Aluminum
- 13:15, 9 September 2020 diff hist -19 LAM 9400/Processes/LNF Aluminum →Etch Rates
- 13:15, 9 September 2020 diff hist +542 LAM 9400/Processes/LNF Aluminum →Parameters Tag: Visual edit
- 13:14, 9 September 2020 diff hist +27 N File:Aluminum corrosion on lines.jpg current
- 19:58, 1 September 2020 diff hist 0 Lithography training session Changed redirect target from Optical lithography#Training Modules to Optical lithography#Training modules current Tag: Redirect target changed
- 19:57, 1 September 2020 diff hist 0 Optical lithography →Training Modules
- 19:56, 1 September 2020 diff hist -123 Lithography training session Changed redirect target from Optical lithography#Training to Optical lithography#Training Modules Tag: Redirect target changed
- 19:45, 1 September 2020 diff hist +52 Optical lithography →Training Module
- 19:43, 1 September 2020 diff hist -5 Optical lithography →Training
- 19:38, 1 September 2020 diff hist +44 Lithography training session Redirected page to Optical lithography#Training Tag: New redirect
- 19:36, 1 September 2020 diff hist +302 Optical lithography
- 14:25, 9 April 2020 diff hist +2 SPR 220 7.0 →Bubbles in resist after spinning
- 14:24, 9 April 2020 diff hist +225 SPR 220 7.0 →Bubbles in resist after spinning
- 14:19, 9 April 2020 diff hist 0 SPR 220 7.0 →Process
- 14:17, 9 April 2020 diff hist 0 SPR 220 7.0 →Resist peeling during DRIE
- 14:17, 9 April 2020 diff hist 0 SPR 220 7.0 →Small bubbles form during DRIE
- 14:16, 9 April 2020 diff hist +1 SPR 220 7.0 →Characterization
- 14:16, 9 April 2020 diff hist -19 SPR 220 7.0 →Characterization
- 14:15, 9 April 2020 diff hist -1 SPR 220 7.0 →Softbake
- 14:15, 9 April 2020 diff hist -145 SPR 220 7.0 →Softbake
- 14:14, 9 April 2020 diff hist 0 N File:SPR 220 10um thickness vs bake time.png current
- 09:16, 7 April 2020 diff hist -1 m Optical lithography →Exposure
- 09:16, 7 April 2020 diff hist +48 m Optical lithography →Equipment
- 08:41, 7 April 2020 diff hist -11 GCA AS200 AutoStep
- 13:33, 3 April 2020 diff hist -83 Parylene C
- 13:30, 3 April 2020 diff hist 0 Parylene C
- 13:30, 3 April 2020 diff hist +281 N File:Parylene C repeat unit.svg == Summary == {{Information | Description= Chemical structure of Parylene N repeat unit | Source= mediawiki commons | Date= 2020-04-3 | Author= Wrightsh (talk) | Permission= {{PD-chem}} | other_versions= }} Category:Chemical structures current
- 13:12, 3 April 2020 diff hist +16 PDMS
- 10:50, 3 April 2020 diff hist +55 Parylene C →Etching
- 10:48, 3 April 2020 diff hist +447 Parylene C →Processes
- 10:32, 3 April 2020 diff hist +250 N File:Crotonic acid.svg == Summary == {{Information | Description= Crotonic acid | Source= mediawiki commons | Date= 2020-04-3 | Author= Wrightsh (talk) | Permission= {{PD-chem}} | other_versions= }} Category:Chemical structures current
- 10:30, 3 April 2020 diff hist 0 N File:PD-icon.svg current
- 10:26, 3 April 2020 diff hist +1 Parylene C
- 10:22, 3 April 2020 diff hist +10 File:Parylene N repeat unit.svg current
- 10:20, 3 April 2020 diff hist -310 File:Parylene N repeat unit.svg →Comments
- 10:19, 3 April 2020 diff hist 0 m Module:Unsubst 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Module:Transclusion count 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Module:Transclusion count/data/I 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Module:Section link 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Module:High-use 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:\sandbox 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:Section link 1 revision imported current
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- 10:19, 3 April 2020 diff hist 0 m Template:High-risk 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:High-use 1 revision imported current
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- 10:19, 3 April 2020 diff hist 0 m Template:Information 1 revision imported current
- 10:19, 3 April 2020 diff hist 0 m Template:Description missing 1 revision imported current
- 10:16, 3 April 2020 diff hist +581 N File:Parylene N repeat unit.svg {{Information | Description= {{en|Chemical structure of en:...}} | Source= {{Own}} | Date= 2020-04-3 | Author= ~~~ | Permission= {{PD-chem}} | other_versions= }} == Comments == High-resolution black/white .SVG made with ChemDraw and IrfanView — see WikiProject Chemistry - structure drawing for detailed instructions. Please drop me a note if you need the source file. [[Category:Chemical...
- 10:13, 3 April 2020 diff hist 0 m Module:Yesno 1 revision imported current
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- 10:13, 3 April 2020 diff hist 0 m Module:Arguments 1 revision imported current
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- 10:13, 3 April 2020 diff hist 0 m Template:Category link 1 revision imported current
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- 10:13, 3 April 2020 diff hist 0 m Template:PD-chem 1 revision imported current
- 10:14, 2 April 2020 diff hist +28 PDMS →Etching
- 10:08, 2 April 2020 diff hist 0 PDMS →Etching
- 09:47, 2 April 2020 diff hist +452 PDMS →Processing Equipment
- 11:58, 1 April 2020 diff hist -109 Optical lithography →Hard bake
- 10:54, 1 April 2020 diff hist 0 Optical lithography →Figures of Merit
- 12:49, 30 March 2020 diff hist -786 m Optical lithography →Plasma descum
- 12:46, 30 March 2020 diff hist -409 m Optical lithography →Hard bake
- 12:44, 30 March 2020 diff hist -3 m Optical lithography →Development
- 12:43, 30 March 2020 diff hist -57 m Optical lithography →Softbake
- 11:27, 30 March 2020 diff hist -12 m Optical lithography →Development
- 11:24, 30 March 2020 diff hist -58 Optical lithography
- 11:24, 30 March 2020 diff hist -2 Optical lithography →Exposure tool selection
- 11:23, 30 March 2020 diff hist -133 Optical lithography →Exposure tool selection
- 10:49, 30 March 2020 diff hist -37 m Optical lithography
- 10:46, 30 March 2020 diff hist +27 Optical lithography
- 10:44, 30 March 2020 diff hist +27 Optical lithography →Equipment
- 14:10, 27 March 2020 diff hist 0 m PDMS Processing Wrightsh moved page LNF Wiki:PDMS to PDMS Processing without leaving a redirect: Pilar
- 09:42, 25 March 2020 diff hist +241 SPR 220 7.0 →Process
- 09:28, 25 March 2020 diff hist +1 m SPR 220 7.0
- 15:46, 10 March 2020 diff hist -62 Plasmatherm 790/Processes/L ox350R current
- 15:45, 10 March 2020 diff hist -35 Plasmatherm 790/Processes/L ox350
- 15:45, 10 March 2020 diff hist -245 Plasmatherm 790/Processes/L ox350
- 15:45, 10 March 2020 diff hist -282 Plasmatherm 790/Processes/L nit350
- 15:44, 10 March 2020 diff hist -282 Plasmatherm 790/Processes/L nit200
- 12:00, 10 March 2020 diff hist -25 Optical lithography
- 12:00, 10 March 2020 diff hist -2,473 Optical lithography →Methods of operation
- 11:23, 10 March 2020 diff hist +4 Optical lithography →Exposure tool selection
- 11:21, 10 March 2020 diff hist +261 Optical lithography →Selection of type of optical lithography
- 10:14, 28 February 2020 diff hist -17 LNF User:LAM 9400 User Processes/Vik GaN BCl3 Cl2
- 10:14, 28 February 2020 diff hist -24 LNF User:LAM 9400 User Processes/Vik GaN BCl3 Cl2 →Capabilities
- 11:10, 26 February 2020 diff hist -4 ACS 200 cluster tool →Supported processes
- 11:09, 26 February 2020 diff hist -240 ACS 200 cluster tool
- 11:09, 26 February 2020 diff hist +20 ACS 200 cluster tool
- 12:58, 25 February 2020 diff hist 0 SB-6E Bonder →System overview
- 12:58, 25 February 2020 diff hist +12 SB-6E Bonder
- 12:57, 25 February 2020 diff hist -16 Substrate bonding
- 12:52, 25 February 2020 diff hist 0 Plasmatherm 790/Processes/L ox200
- 12:52, 25 February 2020 diff hist +1 Plasmatherm 790/Processes/L ox200
- 12:51, 25 February 2020 diff hist -275 Plasmatherm 790/Processes/L ox200
- 12:50, 25 February 2020 diff hist -44 Plasmatherm 790/Processes →PECVD current
- 12:47, 25 February 2020 diff hist -78 Plasmatherm 790
- 12:40, 25 February 2020 diff hist -2 Optical lithography →Exposure
- 12:39, 25 February 2020 diff hist -14 Optical lithography →Exposure
- 12:36, 25 February 2020 diff hist -19 ACS 200 cluster tool
- 12:35, 25 February 2020 diff hist 0 m Optical lithography →Photoresist Spinning
- 12:35, 25 February 2020 diff hist +8 Optical lithography →Photoresist Spinning
- 12:34, 25 February 2020 diff hist 0 Optical lithography →Photoresist Spinning
- 12:34, 25 February 2020 diff hist +12 Optical lithography →HMDS
- 12:33, 25 February 2020 diff hist +2 Optical lithography →Equipment
- 12:32, 25 February 2020 diff hist -826 Optical lithography
- 12:18, 25 February 2020 diff hist -7 Optical lithography Tag: Visual edit: Switched
- 11:42, 25 February 2020 diff hist -393 LAM 9400
- 11:39, 25 February 2020 diff hist -103 LAM 9400
- 15:01, 9 December 2019 diff hist +34 Deep UV SenLights PL16 current
- 19:06, 6 December 2019 diff hist +192 Deep UV SenLights PL16 →Fully cross-link SPR 955
- 19:05, 6 December 2019 diff hist +1 Deep UV SenLights PL16 →Improve Wet Etch Undercut
- 19:04, 6 December 2019 diff hist +92 Deep UV SenLights PL16 →Improve Wet Etch Undercut
- 18:58, 6 December 2019 diff hist +33 Deep UV SenLights PL16
- 18:51, 6 December 2019 diff hist +62 Deep UV SenLights PL16 →Capabilities
- 18:50, 6 December 2019 diff hist 0 Deep UV SenLights PL16 →Process Info
- 18:49, 6 December 2019 diff hist +67 Deep UV SenLights PL16 →Improve Wet Etch Undercut
- 18:47, 6 December 2019 diff hist +72 N File:BHF SiO2 Etch Undercut SPR 955 DUV.jpg 15min BHF etch of SiO2 with SPR 955 mask, 5min in DUV tool current
- 18:44, 6 December 2019 diff hist +1 Deep UV SenLights PL16 →Capabilities
- 12:20, 4 December 2019 diff hist +1 Deep UV SenLights PL16 →Fully cross-link SPR 955
- 12:08, 4 December 2019 diff hist -1 m Deep UV SenLights PL16 →Fully cross-link SPR 955
- 12:08, 4 December 2019 diff hist +206 Deep UV SenLights PL16 →Fully cross-link SPR 955
- 12:05, 4 December 2019 diff hist +73 Deep UV SenLights PL16 →Fully cross-link SPR 955
- 12:04, 4 December 2019 diff hist +124 N File:SPR 955 Litho Cure Litho 2.jpeg SPR 955 patterned, then 5 min DUV exposure, 180C 30 min bake, then a second layer of SPR 955 patterned on top. current
- 12:03, 4 December 2019 diff hist +124 N File:SPR 955 Litho Cure Litho.jpeg SPR 955 patterned, then 5 min DUV exposure, 180C 30 min bake, then a second layer of SPR 955 patterned on top. current
- 11:50, 4 December 2019 diff hist 0 Deep UV SenLights PL16 →Etch Rate
- 11:48, 4 December 2019 diff hist +75 Deep UV SenLights PL16
- 17:02, 26 November 2019 diff hist +115 LAM 9400/Processes/LNF Poly
- 13:55, 1 November 2019 diff hist 0 Deep UV SenLights PL16
- 16:03, 25 October 2019 diff hist +8 m Deep UV SenLights PL16 →Qualification
- 13:46, 25 October 2019 diff hist +113 Deep UV SenLights PL16 →Checkout procedure
- 13:03, 25 October 2019 diff hist -31 Material restrictions
- 12:41, 25 October 2019 diff hist 0 Deep UV SenLights PL16
- 09:58, 25 October 2019 diff hist +424 Material restrictions
- 09:16, 25 October 2019 diff hist -2 Deep UV SenLights PL16 →Material restrictions
- 09:27, 22 October 2019 diff hist -101 ACS 200 cluster tool
- 14:56, 18 October 2019 diff hist -38 Plasmatherm 790/Processes/m si o 1 →Capabilities current
- 13:42, 14 October 2019 diff hist +522 Deep UV SenLights PL16
- 13:25, 14 October 2019 diff hist -26 Deep UV SenLights PL16
- 13:24, 14 October 2019 diff hist +171 Deep UV SenLights PL16
- 13:17, 14 October 2019 diff hist 0 m Deep UV SenLights PL16 →Substrate requirements
- 13:17, 14 October 2019 diff hist +70 Deep UV SenLights PL16 →Capabilities
- 22:06, 8 October 2019 diff hist 0 Deep UV SenLights PL16
- 22:06, 8 October 2019 diff hist -24 Deep UV SenLights PL16
- 22:05, 8 October 2019 diff hist -60 Deep UV SenLights PL16
- 22:01, 8 October 2019 diff hist 0 N File:59000.jpg current
- 22:00, 8 October 2019 diff hist +1 Deep UV SenLights PL16
- 10:10, 7 October 2019 diff hist +87 CEE 200X photoresist spinner 2 →Capabilities
- 10:10, 7 October 2019 diff hist +87 CEE 200X photoresist spinner 1 →Capabilities
- 15:45, 2 October 2019 diff hist -49 LAM 9400/Processes/LNF Poly
- 12:04, 2 October 2019 diff hist 0 Deep UV SenLights PL16
- 12:04, 2 October 2019 diff hist 0 m Deep UV SenLights PL16 Wrightsh moved page SenLights DUV PL16 to Deep UV SenLights PL16 without leaving a redirect
- 14:50, 1 October 2019 diff hist +1 Deep UV SenLights PL16
- 14:50, 1 October 2019 diff hist +56 Deep UV SenLights PL16
- 14:49, 1 October 2019 diff hist +1,483 N Deep UV SenLights PL16 Created page with "{{#vardefine:toolid|?????}} {{#vardefine:technology|Lithography}} {{#vardefine:restriction|3}} {{infobox equipment |caption = |materials = Photoresist |mask = |size = pie..."
- 10:58, 30 September 2019 diff hist +166 GCA AS200 AutoStep →Templates
- 16:15, 23 September 2019 diff hist 0 Incident Reports →2019
- 16:14, 23 September 2019 diff hist +153 Incident Reports →2019
- 14:36, 17 September 2019 diff hist -26 LAM 9400
- 11:19, 16 September 2019 diff hist +107 GCA AS200 AutoStep →Templates
- 08:31, 13 September 2019 diff hist -523 GCA AS200 AutoStep →Maintenance
- 08:30, 13 September 2019 diff hist -118 GCA AS200 AutoStep →Capabilities
- 08:25, 13 September 2019 diff hist -401 GCA AS200 AutoStep →Announcements
- 13:09, 12 September 2019 diff hist -1 SPR 955 →Isolated Trenches
- 13:08, 12 September 2019 diff hist 0 File:1000nm trenches low reflection.jpg Wrightsh uploaded a new version of File:1000nm trenches low reflection.jpg current
- 13:08, 12 September 2019 diff hist 0 File:500nm trenches low reflection.jpg Wrightsh uploaded a new version of File:500nm trenches low reflection.jpg current
- 13:07, 12 September 2019 diff hist 0 File:400nm trenches low reflection.jpg Wrightsh uploaded a new version of File:400nm trenches low reflection.jpg current
- 13:07, 12 September 2019 diff hist 0 File:350nm trenches low reflection.jpg Wrightsh uploaded a new version of File:350nm trenches low reflection.jpg current
- 13:06, 12 September 2019 diff hist +1 SPR 955 →Isolated Lines
- 13:01, 12 September 2019 diff hist 0 File:1000nm lines low reflection.jpg Wrightsh uploaded a new version of File:1000nm lines low reflection.jpg current
- 13:00, 12 September 2019 diff hist 0 File:500nm lines low reflection.jpg Wrightsh uploaded a new version of File:500nm lines low reflection.jpg current
- 12:59, 12 September 2019 diff hist 0 File:400nm lines low reflection.jpg Wrightsh uploaded a new version of File:400nm lines low reflection.jpg current
- 12:59, 12 September 2019 diff hist 0 File:350nm lines low reflection.jpg Wrightsh uploaded a new version of File:350nm lines low reflection.jpg current
- 12:58, 12 September 2019 diff hist +1 SPR 955 →Gratings
- 12:57, 12 September 2019 diff hist 0 File:1000nm gratings low reflection.jpg Wrightsh uploaded a new version of File:1000nm gratings low reflection.jpg current
- 12:56, 12 September 2019 diff hist 0 File:500nm gratings low reflection.jpg Wrightsh uploaded a new version of File:500nm gratings low reflection.jpg current
- 12:55, 12 September 2019 diff hist 0 File:400nm gratings low reflection.jpg Wrightsh uploaded a new version of File:400nm gratings low reflection.jpg current
- 12:54, 12 September 2019 diff hist 0 File:350nm gratings low reflection.jpg Wrightsh uploaded a new version of File:350nm gratings low reflection.jpg current
- 21:49, 11 September 2019 diff hist +44 SPR 955 →Low Reflection Substrate
- 21:48, 11 September 2019 diff hist +149 SPR 955 →Low Reflection Substrate
- 21:46, 11 September 2019 diff hist +26 SPR 955
- 21:43, 11 September 2019 diff hist +186 SPR 955 →Isolated Lines
- 21:40, 11 September 2019 diff hist +1 SPR 955 →Silicon
- 21:40, 11 September 2019 diff hist +10 SPR 955 →Process
- 21:39, 11 September 2019 diff hist +8 SPR 955 →Process
- 21:39, 11 September 2019 diff hist +15 SPR 955 →Process
- 21:37, 11 September 2019 diff hist -1 SPR 955 →Gratings
- 21:37, 11 September 2019 diff hist +272 N File:1000nm gratings low reflection.jpg Stepper exposure matrix failed 1000nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, A...
- 21:36, 11 September 2019 diff hist +264 N File:500nm gratings low reflection.jpg Stepper exposure matrix 500nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25...
- 21:36, 11 September 2019 diff hist +264 N File:400nm gratings low reflection.jpg Stepper exposure matrix 400nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25...
- 21:36, 11 September 2019 diff hist +271 N File:350nm gratings low reflection.jpg Stepper exposure matrix failed 350nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ...
- 21:34, 11 September 2019 diff hist +399 SPR 955 →Gratings
- 21:32, 11 September 2019 diff hist +202 SPR 955 →Isolated Trenches
- 21:32, 11 September 2019 diff hist +256 N File:1000nm trenches low reflection.jpg Stepper exposure matrix 1000nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS dev...
- 21:31, 11 September 2019 diff hist +255 N File:500nm trenches low reflection.jpg Stepper exposure matrix 500nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:31, 11 September 2019 diff hist +255 N File:400nm trenches low reflection.jpg Stepper exposure matrix 400nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:31, 11 September 2019 diff hist +255 N File:350nm trenches low reflection.jpg Stepper exposure matrix 350nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:26, 11 September 2019 diff hist +4 SPR 955 →Isolated Lines
- 21:24, 11 September 2019 diff hist +253 N File:1000nm lines low reflection.jpg Stepper exposure matrix 1000nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:24, 11 September 2019 diff hist +187 SPR 955 →Isolated Lines
- 21:23, 11 September 2019 diff hist 0 File:400nm lines low reflection.jpg Wrightsh uploaded a new version of File:400nm lines low reflection.jpg
- 21:19, 11 September 2019 diff hist 0 File:500nm lines low reflection.jpg Wrightsh uploaded a new version of File:500nm lines low reflection.jpg
- 21:16, 11 September 2019 diff hist 0 File:400nm lines low reflection.jpg Wrightsh uploaded a new version of File:400nm lines low reflection.jpg
- 21:13, 11 September 2019 diff hist +255 N File:500nm lines low reflection.jpg Stepper exposure matrix 500nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:13, 11 September 2019 diff hist +255 N File:400nm lines low reflection.jpg Stepper exposure matrix 400nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
- 21:13, 11 September 2019 diff hist +255 N File:350nm lines low reflection.jpg Stepper exposure matrix 350nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake 110C 90 sec PEB AZ 300 25sec ACS develop
