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Date Name Thumbnail Size Description Versions
15:03, 1 March 2021 STS Pegasus 4 Unswitched Poly 1 um.jpg (file) 118 KB Isolated trench etched using LNF_Switched_poly in the STS Pegasus 4 for 1 min. 1
18:35, 15 March 2021 Etch material layers.png (file) 4 KB Diagram of typical layer stack for an etching process. The top layer is the ''mask'' (for defining the pattern). Beneath is the film to be ''etched''. If the etch reaches the end of this film, the underlying layer is the ''etch stop''. Finally, any material that will not be exposed at any point during the etch is considered ''buried''. 1
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