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| Date | Name | Thumbnail | Size | Description | Versions |
|---|---|---|---|---|---|
| 12:57, 12 September 2019 | 1000nm gratings low reflection.jpg (file) |  |
220 KB | Stepper exposure matrix 1000nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 2... | 1 |
| 13:01, 12 September 2019 | 1000nm lines low reflection.jpg (file) |  |
297 KB | Stepper exposure matrix 1000nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS dev... | 1 |
| 13:08, 12 September 2019 | 1000nm trenches low reflection.jpg (file) |  |
279 KB | Stepper exposure matrix 1000nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS d... | 1 |
| 15:09, 24 November 2014 | 10020.jpg (file) |  |
136 KB | 1 | |
| 16:21, 29 January 2015 | 10030.jpg (file) |  |
195 KB | 1 | |
| 13:25, 10 June 2015 | 10051.jpg (file) |  |
171 KB | 1 | |
| 16:06, 31 July 2015 | 10061.jpg (file) |  |
95 KB | 2 | |
| 12:23, 26 June 2015 | 140020.jpg (file) |  |
151 KB | 1 | |
| 12:22, 26 June 2015 | 140031.jpg (file) |  |
138 KB | 1 | |
| 12:23, 26 June 2015 | 140041.jpg (file) |  |
155 KB | 1 | |
| 10:18, 13 August 2015 | 141031.jpg (file) |  |
163 KB | 1 | |
| 09:09, 28 May 2015 | 142001.jpg (file) |  |
276 KB | 1 | |
| 10:56, 10 December 2014 | 15000.jpg (file) |  |
174 KB | 1 | |
| 21:06, 17 August 2015 | 150001.jpg (file) |  |
180 KB | 2 | |
| 10:01, 20 October 2015 | 171010.jpg (file) |  |
145 KB | 2 | |
| 15:35, 3 October 2015 | 180011.jpg (file) |  |
168 KB | 2 | |
| 15:37, 25 August 2015 | 200071.jpg (file) |  |
153 KB | 2 | |
| 15:17, 18 May 2015 | 21040.jpg (file) |  |
148 KB | 2 | |
| 12:54, 12 September 2019 | 350nm gratings low reflection.jpg (file) |  |
188 KB | Stepper exposure matrix failed 350nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ... | 1 |
| 12:59, 12 September 2019 | 350nm lines low reflection.jpg (file) |  |
371 KB | Stepper exposure matrix 350nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS deve... | 1 |
| 13:07, 12 September 2019 | 350nm trenches low reflection.jpg (file) |  |
389 KB | Stepper exposure matrix 350nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS de... | 1 |
| 12:38, 25 August 2015 | 40061.jpg (file) |  |
192 KB | 2 | |
| 12:55, 12 September 2019 | 400nm gratings low reflection.jpg (file) |  |
444 KB | Stepper exposure matrix 400nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25... | 1 |
| 12:59, 12 September 2019 | 400nm lines low reflection.jpg (file) |  |
494 KB | Stepper exposure matrix 400nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS deve... | 1 |
| 13:07, 12 September 2019 | 400nm trenches low reflection.jpg (file) |  |
375 KB | Stepper exposure matrix 400nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS de... | 1 |
| 10:54, 18 August 2015 | 41000.jpg (file) |  |
150 KB | 4 | |
| 13:52, 3 November 2017 | 50020.jpg (file) |  |
314 KB | 3 | |
| 12:56, 12 September 2019 | 500nm gratings low reflection.jpg (file) |  |
574 KB | Stepper exposure matrix 500nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25... | 1 |
| 13:00, 12 September 2019 | 500nm lines low reflection.jpg (file) |  |
491 KB | Stepper exposure matrix 500nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS deve... | 1 |
| 13:08, 12 September 2019 | 500nm trenches low reflection.jpg (file) |  |
344 KB | Stepper exposure matrix 500nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS de... | 1 |
| 13:24, 3 November 2017 | 50101.jpg (file) |  |
464 KB | Reverted to version as of 17:22, 3 November 2017 | 4 |
| 10:58, 8 February 2021 | 51000.jpg (file) |  |
452 KB | 2 | |
| 11:33, 4 May 2015 | 53081.jpg (file) |  |
88 KB | 1 | |
| 11:00, 29 July 2015 | 53091.jpg (file) |  |
233 KB | 1 | |
| 11:04, 3 August 2015 | 53101.jpg (file) |  |
96 KB | 2 | |
| 14:51, 18 August 2015 | 53111.jpg (file) |  |
191 KB | 2 | |
| 14:52, 18 August 2015 | 53121.jpg (file) |  |
184 KB | 1 | |
| 09:31, 25 August 2015 | 54071.jpg (file) |  |
187 KB | 2 | |
| 22:01, 8 October 2019 | 59000.jpg (file) |  |
174 KB | 1 | |
| 10:20, 4 May 2015 | 62040.jpg (file) |  |
150 KB | 2 | |
| 09:45, 10 March 2015 | 71011.jpg (file) |  |
59 KB | 1 | |
| 13:14, 9 September 2020 | Aluminum corrosion on lines.jpg (file) |  |
300 KB | 1 | |
| 18:47, 6 December 2019 | BHF SiO2 Etch Undercut SPR 955 DUV.jpg (file) |  |
165 KB | 15min BHF etch of SiO2 with SPR 955 mask, 5min in DUV tool | 1 |
| 11:36, 3 August 2015 | CEE Correct Sample.jpg (file) |  |
40 KB | 2 | |
| 15:12, 3 August 2015 | CEE Developer recipe name format.png (file) |  |
20 KB | xyz | 1 |
| 14:55, 1 May 2014 | CEE Developers.jpg (file) |  |
41 KB | 1 | |
| 11:38, 3 August 2015 | CEE Incorrect Sample.jpg (file) |  |
45 KB | 3 | |
| 16:27, 5 November 2014 | CMP Strasbaugh 6EC.png (file) |  |
316 KB | 1 | |
| 10:32, 3 April 2020 | Crotonic acid.svg (file) |  |
4 KB | == Summary == {{Information | Description= Crotonic acid | Source= mediawiki commons | Date= 2020-04-3 | Author= Wrightsh (talk) | Permission= {{PD-chem}} | other_versions= }} Category:Chemical structures | 1 |
| 17:12, 9 February 2016 | Down arrow.svg (file) |  |
698 bytes | 1 |
