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Date Name Thumbnail Size Description Versions
08:03, 3 May 2021 Laurell.jpg (file) 329 KB   2
09:58, 8 February 2021 51000.jpg (file) 452 KB   2
12:14, 9 September 2020 Aluminum corrosion on lines.jpg (file) 300 KB   1
13:14, 9 April 2020 SPR 220 10um thickness vs bake time.png (file) 23 KB   1
12:30, 3 April 2020 Parylene C repeat unit.svg (file) 6 KB == Summary == {{Information | Description= Chemical structure of Parylene N repeat unit | Source= mediawiki commons | Date= 2020-04-3 | Author= Wrightsh (talk) | Permission= {{PD-chem}} | other_versions= }} Category:Chemical structures 1
09:32, 3 April 2020 Crotonic acid.svg (file) 4 KB == Summary == {{Information | Description= Crotonic acid | Source= mediawiki commons | Date= 2020-04-3 | Author= Wrightsh (talk) | Permission= {{PD-chem}} | other_versions= }} Category:Chemical structures 1
09:30, 3 April 2020 PD-icon.svg (file) 517 bytes   1
09:16, 3 April 2020 Parylene N repeat unit.svg (file) 5 KB {{Information | Description= {{en|Chemical structure of en:...}} | Source= {{Own}} | Date= 2020-04-3 | Author= ~~~ | Permission= {{PD-chem}} | other_versions= }} == Comments == High-resolution black/white .SVG made with ChemDraw and IrfanView — see WikiProject Chemistry - structure drawing for detailed instructions. Please drop me a note if you need the source file. [[Category:Chemical... 1
17:47, 6 December 2019 BHF SiO2 Etch Undercut SPR 955 DUV.jpg (file) 165 KB 15min BHF etch of SiO2 with SPR 955 mask, 5min in DUV tool 1
11:04, 4 December 2019 SPR 955 Litho Cure Litho 2.jpeg (file) 155 KB SPR 955 patterned, then 5 min DUV exposure, 180C 30 min bake, then a second layer of SPR 955 patterned on top. 1
11:03, 4 December 2019 SPR 955 Litho Cure Litho.jpeg (file) 155 KB SPR 955 patterned, then 5 min DUV exposure, 180C 30 min bake, then a second layer of SPR 955 patterned on top. 1
21:01, 8 October 2019 59000.jpg (file) 174 KB   1
12:08, 12 September 2019 1000nm trenches low reflection.jpg (file) 279 KB Stepper exposure matrix 1000nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS d... 1
12:08, 12 September 2019 500nm trenches low reflection.jpg (file) 344 KB Stepper exposure matrix 500nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS de... 1
12:07, 12 September 2019 400nm trenches low reflection.jpg (file) 375 KB Stepper exposure matrix 400nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS de... 1
12:07, 12 September 2019 350nm trenches low reflection.jpg (file) 389 KB Stepper exposure matrix 350nm isolated trenches in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS de... 1
12:01, 12 September 2019 1000nm lines low reflection.jpg (file) 297 KB Stepper exposure matrix 1000nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS dev... 1
12:00, 12 September 2019 500nm lines low reflection.jpg (file) 491 KB Stepper exposure matrix 500nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS deve... 1
11:59, 12 September 2019 400nm lines low reflection.jpg (file) 494 KB Stepper exposure matrix 400nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS deve... 1
11:59, 12 September 2019 350nm lines low reflection.jpg (file) 371 KB Stepper exposure matrix 350nm isolated lines in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25sec ACS deve... 1
11:57, 12 September 2019 1000nm gratings low reflection.jpg (file) 220 KB Stepper exposure matrix 1000nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 2... 1
11:56, 12 September 2019 500nm gratings low reflection.jpg (file) 574 KB Stepper exposure matrix 500nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25... 1
11:55, 12 September 2019 400nm gratings low reflection.jpg (file) 444 KB Stepper exposure matrix 400nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ 300 25... 1
11:54, 12 September 2019 350nm gratings low reflection.jpg (file) 188 KB Stepper exposure matrix failed 350nm gratings (50/50 duty cycle) in 0.97µm of SPR 955. Substrate is Si, 5nm SiO2, 34nm Si3N4, 5nm SiO2 and should have ~10% reflection at 365nm (couldn't measure this directly). 100C 90 sec softbake, 110C 90 sec PEB, AZ... 1
10:06, 2 July 2019 LAM 9400 TiN sel Al2O3.jpg (file) 117 KB 27nm of Veeco TiN on Si, patterned with SPR 955, etched in the LAM 9400 for 20 seconds (~15sec of overetch), 500nm grating. 1
09:25, 18 December 2018 LAM 9400 Aluminum 700nm.png (file) 1.7 MB LNF_Aluminum Etch in LAM 9400 1
09:25, 18 December 2018 LAM 9400 Aluminum 3000nm.png (file) 1.44 MB LNF_Aluminum Etch in LAM 9400 1
09:24, 18 December 2018 LAM 9400 Aluminum 500nm.png (file) 1.62 MB LNF_Aluminum Etch in LAM 9400 1
18:41, 11 September 2018 SPR220 3um develop time.jpg (file) 259 KB   1
18:39, 11 September 2018 SPR220 3um stepper focus.jpg (file) 180 KB   1
18:25, 11 September 2018 SPR220 3um aligner grating silicon.jpg (file) 474 KB   1
09:29, 11 September 2018 SPR220 3um stepper trench 700nm.jpg (file) 575 KB   1
09:28, 11 September 2018 SPR220 3um stepper trench 1um.jpg (file) 565 KB   1
09:28, 11 September 2018 SPR220 3um stepper grating low reflection.jpg (file) 1.1 MB   1
09:27, 11 September 2018 SPR220 3um stepper grating aluminum.jpg (file) 1.13 MB   1
09:26, 11 September 2018 SPR220 3um stepper grating silicon.jpg (file) 830 KB   1
11:36, 3 May 2018 Stepper 500nm Grating SPR 955 0.97µm CD Loss vs Defocus.png (file) 145 KB This shows the CD loss of a 500nm grating in the stepper in SPR 955 0.97µm. Much beyond 1µm and the pattern wont resolve. 1
12:27, 2 May 2018 SPR 955 0.97µm CD Loss vs Exposure.png (file) 156 KB   2
08:11, 1 May 2018 Vik GaN etchratefit.png (file) 27 KB   1
12:52, 3 November 2017 50020.jpg (file) 314 KB   3
12:24, 3 November 2017 50101.jpg (file) 464 KB Reverted to version as of 17:22, 3 November 2017 4
09:48, 16 August 2017 SPR 955 500nm grating.jpg (file) 80 KB   2
14:47, 22 June 2017 XDev-GaN-1-Trench.png (file) 265 KB   1
14:47, 22 June 2017 XDev-GaN-1-Line.png (file) 265 KB   1
10:19, 31 January 2017 Uk submicron 1um.jpg (file) 137 KB STS APS DGRIE Uk Submicron Etch in 1µm Feature 1
10:18, 31 January 2017 Uk submicron 2um.jpg (file) 165 KB   1
13:10, 11 February 2016 SPR 955 2um grating.png (file) 198 KB   1
16:13, 9 February 2016 No change arrow.svg (file) 787 bytes   1
16:12, 9 February 2016 Down down arrow.svg (file) 944 bytes   1
16:12, 9 February 2016 Down arrow.svg (file) 698 bytes   1
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