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Sputter deposition

3 bytes added, 5 years ago
===PVD 75 Magentron Sputter Tool===
{{main|PVD 75 Proline}}
*Materials deposited: [[Al2O3|Al<sub>2</sub>O<sub>3</sub>]],[[Aluminum|Al]],[[Chromium|Cr]],[[Copper|Cu]], [[Silicon|Si]], [[Silicon Dioxide|SiO<sub>2</sub>]], [[Silicon Nitride|Si<sub>3</sub>N<sub>4</sub>]], [[Nickel|Ni]], [[Silver|Ag]], [[Titanium|Ti]]
*The PVD 75 tool is designed specifically for point of use processing. Qualified users can change targets when they vent the chamber to load their samples.
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