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Plasmatherm 790/Processes/L nit350

12 bytes removed, 1 year ago
|-
| Deposition Rate
| 427.3 Å9 nm/secmin
|-
| Index of Refraction
| 21.00 ± 0.02999
|-
| Stress
| 50 ± 50 10 MPa
|-
|}
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