The Plasmatherm 790 is a dual chamber parallel plate tool. The left chamber is configured for [[Reactive ion etching|reactive ion etching (RIE)]] while the right chamber is configured for [[Plasma enhanced chemical vapor deposition|plasma enhanced chemical vapor deposition (PECVD)]]. The RIE chamber is significantly slower then other etchers available in the lab, allowing greater depth control on thin films. The PECVD chamber is also designed to deposit at a lower rate then the [[GSI PECVD]] and [[P5000 PECVD]] - the smaller building blocks helps improve film quality. This tool has almost no material restrictions, allowing a wide variety of processing.