Stripping resist
Warning: | This page has not been released yet. |
Photoresist stripping is the removal of photoresist layers from a substrate. The purpose is to eliminate the photoresist without allowing the materials underneath to get attacked.
About this Process | |
---|---|
Process Details | |
Equipment | Stripping resist |
Technology | [[]] |
Procedure
There are two possible routes to stripping resist: wet strip or dry strip.
Widget text will go here.