Difference between revisions of "Tantalum"

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A description & relevant information for this material need to be added. If it is not grown or deposited in the lab make sure this in mentioned here.
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Tantalum (Ta) is a chemical element with the atomic number 73. It is a part of the refractory metals group. These metals are widely used as compounds in alloys. The physical properties are being dense, ductile, hard, and highly conductive to both heat and electricity.
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In appearance it is a dark grey in color.
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==Equipment==
 
==Equipment==
 
Process technologies that can be used to deposit/pattern this material.  If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.
 
Process technologies that can be used to deposit/pattern this material.  If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.
 
===Deposition Equipment===
 
===Deposition Equipment===
*Tools in the LNF for depositing this material.
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*[[Angstrom Engineering Evovac Evaporator]]
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*[[Lab 18-1]]
 
===Etching Equipment===
 
===Etching Equipment===
*Tools in the LNF for etching this material.
 
 
===Characterization Equipment===
 
===Characterization Equipment===
*Metrology/Characterization equipment available in the LNF for measuring physical, optical, and surface properties of this material.
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*[[Dektak XT]]
  
 
==Applications==
 
==Applications==
*Discuss common uses/applications for this material. Why this materials is used in the LNF?
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*In electronic equipment, tanatalum is often used in mobile phones, dvd layers and video game consoles as capacitors.
  
 
==Processes==
 
==Processes==
 
===Deposition Processes===
 
===Deposition Processes===
* List of technologies for depositing this material and relevant process information specific to this material associated with this equipment/type of process.
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*[[Electron_beam_evaporation|E-beam evaporation]]
  
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*[[Sputter_deposition|Sputter deposition]]
 
===Etching Processes===
 
===Etching Processes===
* List of technologies for etching/pattering this material and relevant process information specific to this material associated with this equipment/type of process.
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* [[Plasma etching]]
  
 
===Characterization Processes===
 
===Characterization Processes===
* List of techniques for metrology/characterization can be used with this material and relevant process information specific to this material associated with this equipment/type of process.
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* The Dektak can be used to measure the thickness of the deposition.
  
 
==Other Relevant Material Information==
 
==Other Relevant Material Information==

Latest revision as of 10:18, 24 April 2020

Warning Warning: This page has not been released yet.

Tantalum (Ta) is a chemical element with the atomic number 73. It is a part of the refractory metals group. These metals are widely used as compounds in alloys. The physical properties are being dense, ductile, hard, and highly conductive to both heat and electricity. In appearance it is a dark grey in color.

Equipment

Process technologies that can be used to deposit/pattern this material. If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.

Deposition Equipment

Etching Equipment

Characterization Equipment

Applications

  • In electronic equipment, tanatalum is often used in mobile phones, dvd layers and video game consoles as capacitors.

Processes

Deposition Processes

Etching Processes

Characterization Processes

  • The Dektak can be used to measure the thickness of the deposition.

Other Relevant Material Information

Technical Data

  • Charts or specific LNF related data for this material.

References

  • Citations/references for this material, review articles. If possible, examples of users publications which includes the material.