Difference between revisions of "Tantalum"
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*[[Lab 18-1]] | *[[Lab 18-1]] | ||
===Etching Equipment=== | ===Etching Equipment=== | ||
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===Characterization Equipment=== | ===Characterization Equipment=== | ||
*[[Dektak XT]] | *[[Dektak XT]] | ||
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*[[Sputter_deposition|Sputter deposition]] | *[[Sputter_deposition|Sputter deposition]] | ||
===Etching Processes=== | ===Etching Processes=== | ||
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===Characterization Processes=== | ===Characterization Processes=== | ||
Latest revision as of 10:18, 24 April 2020
 Warning: | This page has not been released yet. |
Tantalum (Ta) is a chemical element with the atomic number 73. It is a part of the refractory metals group. These metals are widely used as compounds in alloys. The physical properties are being dense, ductile, hard, and highly conductive to both heat and electricity. In appearance it is a dark grey in color.
Contents
Equipment
Process technologies that can be used to deposit/pattern this material. If this is a substrate, refer to what tool/process restrictions there may be and possibly remove the following sub-sections.
Deposition Equipment
Etching Equipment
Characterization Equipment
Applications
- In electronic equipment, tanatalum is often used in mobile phones, dvd layers and video game consoles as capacitors.
Processes
Deposition Processes
Etching Processes
Characterization Processes
- The Dektak can be used to measure the thickness of the deposition.
Other Relevant Material Information
Technical Data
- Charts or specific LNF related data for this material.
References
- Citations/references for this material, review articles. If possible, examples of users publications which includes the material.
