Tempress S3T3 - Flat Poly-Si 4"

Tempress S3T3 - Flat Poly-Si 4"
Equipment Details
Technology	LPCVD
Materials Restriction	CMOS Clean
Sample Size	Pieces up to 100 mm (4")
Gases Used	N2, SiH4
Equipment Manual
Overview	System Overview
Operating Procedure	SOP
Supported Processes	Polysilicon, Annealed polysilicon, Amorphous silicon
Maintenance	Maintenance

The Tempress diffusion system is a modular horizontal furnace designed to process silicon wafers as part of the manufacturing technology of semiconductor, optical, MEMS, and solar devices. Polysilicon, Low Stress Poly-Si, and Amorphous silicon are formed by using a process called LPCVD, Low Pressure Chemical Vapor Deposition. Chemical vapor deposition forms thin films on the surface of a substrate by thermal decomposition and/or reaction of gaseous compounds. The desired material is deposited directly from the gas phase onto the surface of the wafer. The important factors are gas ratio, temperature, and pressure.

Announcements

• S3T3 will be down until further notice. S4T3 can be used for Poly-Si and for Annealed Poly-Si until S3T3 has been repaired.

Capabilities

• Polysilicon
• Annealed polysilicon
• Amorphous silicon
• Maximum Thickness
  • Polysilicon - 2µm
  • Annealed Polysilicon - 10µm
  • Amorphous Silicon - 2µm

System overview

Hardware details

• N₂ - Maximum flow 10 slpm
• SiH₄ - Maximum flow 300 sccm

Substrate requirements

• Silicon only
• Pieces up to 100 mm (4")
• Can process up to 25, 100 mm (4"), wafers

All samples must go through the RCA Pre-Furnace clean procedure before being processed in the furnace

Material restrictions

The Tempress S3T3 - Flat Poly-Si 4" is designated as a CMOS Clean class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.

Approved materials

Supported processes

• Polysilicon
• Annealed polysilicon
• Amorphous silicon

Characterization data

• Polysilicon
• Annealed polysilicon

Standard operating procedure

• Quick reference SOP
• Detailed SOP

Checkout procedure

1. Create a Helpdesk Ticket requesting training.
2. A process engineer will schedule a time for initial training. After completing training the user can attempt a checkout session. It may be necessary for some users to participate in more than one training session, prior to attempting check out.
3. Schedule a checkout session with a tool engineer via the Helpdesk Ticket system. If this checkout is successful, the engineer will authorize you on the tool.

Maintenance

• Boats and dummy wafers are replaced every 20-30µm of accumulated deposition.
• Tube is replaced at 100µm of accumulated deposition.