Xenon difluoride
Revision as of 13:07, 10 June 2015 by Wrightsh (talk | contribs) (Wrightsh moved page Xenon Difluoride to Xenon difluoride without leaving a redirect)
Description
Xenon Difluoride is a chemical used for etching Si. It is a solid at standard temperature and pressure but sublimates to a gas at lower pressures. The Xactix XeF2 is the only tool in the lab that uses XeF2.
Processes
- There are currently no processes defined that use this chemical.
Equipment
Safety Data Sheet
References
Internal References: {Incoming} External References:
- There are currently no external references
