Difference between revisions of "YES-CV200RFS(E)"
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The chamber is disassembled and cleaned once per quarter and process condition is verified. | The chamber is disassembled and cleaned once per quarter and process condition is verified. | ||
− | ===User | + | ===User authorized maintenance=== |
The only maintenance that users are authorized to perform is tool startup in the event of a power bump. Please see the [https://docs.google.com/document/d/13gVIzr2tf87rtDnioNH-qU8P1Vk_1km3w7d9oy-PnRA/preview Startup and Shutdown Procedure] for more details. | The only maintenance that users are authorized to perform is tool startup in the event of a power bump. Please see the [https://docs.google.com/document/d/13gVIzr2tf87rtDnioNH-qU8P1Vk_1km3w7d9oy-PnRA/preview Startup and Shutdown Procedure] for more details. |
Revision as of 18:09, 31 August 2020
YES-CV200RFS(E) | |
---|---|
Equipment Details | |
Manufacturer | Yield Engineering Systems |
Model | CV200RFS(E) |
Technology | Plasma etching |
Materials Restriction | Metals |
Material Processed | photoresist, polymers |
Sample Size | pieces up to 8" wafers |
Gases Used |
O2 Ar N2 NF3 |
Equipment Manual | |
User Manual | User Manual |
Overview | System overview |
Supported Processes | Supported processes |
Maintenance | Maintenance |
The YES-CV200RFS(E) is a single wafer, downstream plasma strip/descum tool designed by Yield Engineering Systems. It is designed for fast plasma stripping of photoresists and other organic materials at up to 7000 Å/min. It can also be used for surface modification and gentle surface cleaning. It supports pieces and wafers from 2” to 8” and wafer pieces. The tool mainly uses oxygen plasma for organics removal, but it has been configured with three additional process gases (Ar, N2, and NF3), for additional stripping and surface modification techniques.
Contents
Announcements
9/1/2020
5/20/2020
Capabilities
- Photoresist descum (600 Å/min)
- Photoresist stripping (6000 Å/min)
- High temperature plasma cleaning/organics etching
- PDMS surface activation
- Sacrificial polymer layer release
- Fluorocarbon removal in high aspect ratio structures
System overview
Hardware Details
- Downstream RF plasma: up to 1000 W
- Heated chuck: 30°C – 200°C
- Gases: O2, Ar, N2, NF3
Substrate requirements
- Handles up to 8” wafers and wafer pieces
- Single wafer processing (or dual 4" wafers)
- Max sample thickness: 3 mm
Material restrictions
The YES-CV200RFS(E) is designated as a Metals class tool. Below is a list of approved materials for the tool. Approved means the material is allowed in the tool under normal circumstances. If a material is not listed, please create a helpdesk ticket or email info@lnf.umich.edu for any material requests or questions.
Supported processes
The tool is provided with 6 characterized recipes, shown in the table below. Process time is chosen on the main panel before starting the recipe. The original process times for recipes 1, 2, and 4 have been included for reference. If you need process adjustment beyond this, please consult a tool engineer before creating a recipe to be authorized to edit recipes, and please do not save over the 6 supported recipes. There are 12 recipe slots in total, please save your recipe to one of 7-12. We cannot guarantee that it will be there for your next run, so remember to write down your settings.
Purpose | Chamber clean | Strip photoresist | Descum | Strip KMPR | ||
---|---|---|---|---|---|---|
(prev) 3 μm | any | (prev) 200 Å | any | any | ||
Recipe # | 1 | 2 | 3 | 4 | 5 | 6 |
Time (sec) | (prev) 300 | (prev) 360 | var. | (prev) 20 | var. | var. |
Chuck temp. (°C) | 60 | 150 | 60 | 150 | ||
O2 flow (sccm) | 50 | 80 | 35 | 80 | ||
NF3 flow (sccm) | 0 | 0 | 0 | 8 | ||
Power (W) | 800 | 800 | 100 | 800 | ||
Etch rate (Å/min) | 5000 | 600 | ||||
Uniformity (%) | 1.5 | 20 |
Use of custom recipes requires additional training. Please see the checkout procedure below. Custom recipes may be documented on YES-CV200RFS(E) User Processes. If you are curious if your material can be processed in this tool, please contact the tool engineers via the helpdesk ticket system.
Standard operating procedure
The operating system can be found in the complete user manual, found here.
Checkout procedure
Follow this procedure to receive authorization to run supported processes. Practicing with an authorized user or staff member is strongly recommended but not required.
- Read this page and the user manual.
- Accurately complete the checkout quiz (you may retake if necessary).
- Create a helpdesk ticket requesting authorization.
- Given successful completion of the quiz, a tool engineer will authorize you on the tool.
Super user checkout procedure
- Complete the process request form and create a helpdesk ticket.
- Review the procedure provided in the ticket response.
- Accurately complete the quiz provided in the ticket response.
- Arrange a training session with a tool engineer via the ticket.
- Given successful completion of the quiz and demonstration of proper tool operation, a tool engineer will provide the access code. Do not share the access code.
Maintenance
The chamber is disassembled and cleaned once per quarter and process condition is verified.
User authorized maintenance
The only maintenance that users are authorized to perform is tool startup in the event of a power bump. Please see the Startup and Shutdown Procedure for more details.